JPS5253671A - Channeling injection controlling method - Google Patents
Channeling injection controlling methodInfo
- Publication number
- JPS5253671A JPS5253671A JP12881075A JP12881075A JPS5253671A JP S5253671 A JPS5253671 A JP S5253671A JP 12881075 A JP12881075 A JP 12881075A JP 12881075 A JP12881075 A JP 12881075A JP S5253671 A JPS5253671 A JP S5253671A
- Authority
- JP
- Japan
- Prior art keywords
- controlling method
- injection controlling
- channeling
- channeling injection
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Element Separation (AREA)
Abstract
PURPOSE: To simplify the channeling control of ion implantation by inserting a current detecting element between a suppressing section and a bias power supply for the same, and detecting minimum current to complete alignment of axes.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12881075A JPS5253671A (en) | 1975-10-28 | 1975-10-28 | Channeling injection controlling method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12881075A JPS5253671A (en) | 1975-10-28 | 1975-10-28 | Channeling injection controlling method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5253671A true JPS5253671A (en) | 1977-04-30 |
Family
ID=14993968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12881075A Pending JPS5253671A (en) | 1975-10-28 | 1975-10-28 | Channeling injection controlling method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5253671A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003511845A (en) * | 1999-10-13 | 2003-03-25 | アプライド マテリアルズ インコーポレイテッド | Beam alignment measurement in ion implantation using Rutherford backscattering |
-
1975
- 1975-10-28 JP JP12881075A patent/JPS5253671A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003511845A (en) * | 1999-10-13 | 2003-03-25 | アプライド マテリアルズ インコーポレイテッド | Beam alignment measurement in ion implantation using Rutherford backscattering |
JP4838470B2 (en) * | 1999-10-13 | 2011-12-14 | アプライド マテリアルズ インコーポレイテッド | Beam alignment measurement in ion implantation using Rutherford backscattering |
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