JPS5244852Y2 - - Google Patents
Info
- Publication number
- JPS5244852Y2 JPS5244852Y2 JP1972125453U JP12545372U JPS5244852Y2 JP S5244852 Y2 JPS5244852 Y2 JP S5244852Y2 JP 1972125453 U JP1972125453 U JP 1972125453U JP 12545372 U JP12545372 U JP 12545372U JP S5244852 Y2 JPS5244852 Y2 JP S5244852Y2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
- G03D13/02—Containers; Holding-devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
- G03D3/02—Details of liquid circulation
- G03D3/04—Liquid agitators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1972125453U JPS5244852Y2 (pt) | 1972-11-01 | 1972-11-01 | |
DE19732354592 DE2354592A1 (de) | 1972-11-01 | 1973-10-31 | Photoresist-entwicklungsverfahren und vorrichtung zur durchfuehrung desselben |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1972125453U JPS5244852Y2 (pt) | 1972-11-01 | 1972-11-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4980848U JPS4980848U (pt) | 1974-07-12 |
JPS5244852Y2 true JPS5244852Y2 (pt) | 1977-10-12 |
Family
ID=14910454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1972125453U Expired JPS5244852Y2 (pt) | 1972-11-01 | 1972-11-01 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5244852Y2 (pt) |
DE (1) | DE2354592A1 (pt) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3122544A1 (de) * | 1981-06-05 | 1982-12-30 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zum aetzen von durchbruechen in glasplatten |
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1972
- 1972-11-01 JP JP1972125453U patent/JPS5244852Y2/ja not_active Expired
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1973
- 1973-10-31 DE DE19732354592 patent/DE2354592A1/de active Pending
Non-Patent Citations (1)
Title |
---|
CIRCUITS MANUFACTURING=1972 * |
Also Published As
Publication number | Publication date |
---|---|
DE2354592A1 (de) | 1974-05-09 |
JPS4980848U (pt) | 1974-07-12 |