JPS5240966A - Method of making semiconductor single crystal having adjustable density of doping materials - Google Patents
Method of making semiconductor single crystal having adjustable density of doping materialsInfo
- Publication number
- JPS5240966A JPS5240966A JP8737476A JP8737476A JPS5240966A JP S5240966 A JPS5240966 A JP S5240966A JP 8737476 A JP8737476 A JP 8737476A JP 8737476 A JP8737476 A JP 8737476A JP S5240966 A JPS5240966 A JP S5240966A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- semiconductor single
- making semiconductor
- doping materials
- adjustable density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
- C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19752542867 DE2542867A1 (en) | 1975-09-25 | 1975-09-25 | PROCESS FOR MANUFACTURING SEMICONDUCTOR SINGLE CRYSTALS WITH ADJUSTABLE DOPENANT CONCENTRATION |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5240966A true JPS5240966A (en) | 1977-03-30 |
Family
ID=5957446
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8737476A Pending JPS5240966A (en) | 1975-09-25 | 1976-07-23 | Method of making semiconductor single crystal having adjustable density of doping materials |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS5240966A (en) |
BE (1) | BE846557A (en) |
DE (1) | DE2542867A1 (en) |
DK (1) | DK381276A (en) |
FR (1) | FR2325425A1 (en) |
IT (1) | IT1066181B (en) |
NL (1) | NL7609300A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59156993A (en) * | 1983-02-23 | 1984-09-06 | Komatsu Denshi Kinzoku Kk | Method and device for doping cz single crystal |
JPS61227986A (en) * | 1985-03-30 | 1986-10-11 | Shin Etsu Handotai Co Ltd | Production of single crystal silicon rod |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19936838A1 (en) * | 1999-08-05 | 2001-02-15 | Wacker Siltronic Halbleitermat | Production of a single crystal doped with nitrogen comprises using a dopant in powdered form containing nitride-bound silicon |
KR20030015239A (en) * | 2000-05-10 | 2003-02-20 | 엠이엠씨 일렉트로닉 머티리얼즈 인코포레이티드 | Method and device for feeding arsenic dopant into a silicon crystal growing process |
US7132091B2 (en) | 2001-09-28 | 2006-11-07 | Memc Electronic Materials, Inc. | Single crystal silicon ingot having a high arsenic concentration |
US7922817B2 (en) | 2008-04-24 | 2011-04-12 | Memc Electronic Materials, Inc. | Method and device for feeding arsenic dopant into a silicon crystal growing apparatus |
-
1975
- 1975-09-25 DE DE19752542867 patent/DE2542867A1/en active Pending
-
1976
- 1976-07-23 JP JP8737476A patent/JPS5240966A/en active Pending
- 1976-08-20 NL NL7609300A patent/NL7609300A/en not_active Application Discontinuation
- 1976-08-24 DK DK381276A patent/DK381276A/en unknown
- 1976-09-22 IT IT5138376A patent/IT1066181B/en active
- 1976-09-24 FR FR7628759A patent/FR2325425A1/en not_active Withdrawn
- 1976-09-24 BE BE170910A patent/BE846557A/en unknown
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59156993A (en) * | 1983-02-23 | 1984-09-06 | Komatsu Denshi Kinzoku Kk | Method and device for doping cz single crystal |
JPS61227986A (en) * | 1985-03-30 | 1986-10-11 | Shin Etsu Handotai Co Ltd | Production of single crystal silicon rod |
JPH037637B2 (en) * | 1985-03-30 | 1991-02-04 | Shinetsu Handotai Kk |
Also Published As
Publication number | Publication date |
---|---|
DK381276A (en) | 1977-03-26 |
NL7609300A (en) | 1977-03-29 |
IT1066181B (en) | 1985-03-04 |
BE846557A (en) | 1977-03-24 |
FR2325425A1 (en) | 1977-04-22 |
DE2542867A1 (en) | 1977-03-31 |
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