JPS5240233B1 - - Google Patents

Info

Publication number
JPS5240233B1
JPS5240233B1 JP46047584A JP4758471A JPS5240233B1 JP S5240233 B1 JPS5240233 B1 JP S5240233B1 JP 46047584 A JP46047584 A JP 46047584A JP 4758471 A JP4758471 A JP 4758471A JP S5240233 B1 JPS5240233 B1 JP S5240233B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46047584A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5240233B1 publication Critical patent/JPS5240233B1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Physical Vapour Deposition (AREA)
JP46047584A 1970-06-29 1971-06-29 Pending JPS5240233B1 (show.php)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5084470A 1970-06-29 1970-06-29

Publications (1)

Publication Number Publication Date
JPS5240233B1 true JPS5240233B1 (show.php) 1977-10-11

Family

ID=21967825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46047584A Pending JPS5240233B1 (show.php) 1970-06-29 1971-06-29

Country Status (3)

Country Link
US (1) US3636917A (show.php)
JP (1) JPS5240233B1 (show.php)
GB (1) GB1329876A (show.php)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856414A (en) * 1973-01-18 1974-12-24 Paulmar Inc Apparatus for inspecting strip material
US3858547A (en) * 1973-12-14 1975-01-07 Nils H Bergfelt Coating machine having an adjustable rotation system
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
US4553034A (en) * 1983-12-02 1985-11-12 Westinghouse Electric Corp. Ion exchange resin intrusion monitor
US5226107A (en) * 1992-06-22 1993-07-06 General Dynamics Corporation, Space Systems Division Apparatus and method of using fiber-optic light guide for heating enclosed test articles
GB0218998D0 (en) * 2002-08-14 2002-09-25 Oxford Instr Plasma Technology Thin film deposition apparatus
ITTO20050780A1 (it) * 2005-11-03 2007-05-04 Geo S R L Dispositivo e procedimento di trattamento e consolidamento di blocchi e lastre di pietra.
US7679063B2 (en) * 2005-11-07 2010-03-16 Cardinal Cg Company Method and apparatus for identifying photocatalytic coatings
KR102002849B1 (ko) * 2012-09-17 2019-07-24 삼성디스플레이 주식회사 증착 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2315282A (en) * 1939-10-21 1943-03-30 Harold A Snow Method of and apparatus for determining characteristics of surfaces
US2478206A (en) * 1944-02-24 1949-08-09 Westinghouse Electric Corp Multirotor gas turbine power plant with propeller
US2656845A (en) * 1948-03-06 1953-10-27 Fmc Corp Apparatus for testing and controlling the concentration of solutions
US2973686A (en) * 1957-10-11 1961-03-07 Gen Precision Inc Apparatus for spectrophotometric monitoring of thin film coatings
GB923885A (en) * 1958-10-30 1963-04-18 Courtaulds Ltd Nephelometers
US3016464A (en) * 1959-06-10 1962-01-09 Daystrom Inc Apparatus for determining the location and thickness of a reflecting object
US3017512A (en) * 1959-06-29 1962-01-16 American Can Co Coating thickness gauge
US3185024A (en) * 1962-03-08 1965-05-25 Donart Electronics Inc Method and apparatus for optically measuring the thickness of thin transparent films
BE638309A (show.php) * 1963-10-08
US3549264A (en) * 1968-11-13 1970-12-22 Hunter Associates Lab Inc Instrument for measuring the geometric attributes of metallic appearance by measuring light reflected at various angles from a surface

Also Published As

Publication number Publication date
GB1329876A (en) 1973-09-12
US3636917A (en) 1972-01-25

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