JPS5235720B2 - - Google Patents
Info
- Publication number
- JPS5235720B2 JPS5235720B2 JP8372371A JP8372371A JPS5235720B2 JP S5235720 B2 JPS5235720 B2 JP S5235720B2 JP 8372371 A JP8372371 A JP 8372371A JP 8372371 A JP8372371 A JP 8372371A JP S5235720 B2 JPS5235720 B2 JP S5235720B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Silicon Polymers (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8372371A JPS5235720B2 (cg-RX-API-DMAC7.html) | 1971-10-22 | 1971-10-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8372371A JPS5235720B2 (cg-RX-API-DMAC7.html) | 1971-10-22 | 1971-10-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4848000A JPS4848000A (cg-RX-API-DMAC7.html) | 1973-07-07 |
| JPS5235720B2 true JPS5235720B2 (cg-RX-API-DMAC7.html) | 1977-09-10 |
Family
ID=13810420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8372371A Expired JPS5235720B2 (cg-RX-API-DMAC7.html) | 1971-10-22 | 1971-10-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5235720B2 (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0164598A3 (en) * | 1984-05-14 | 1986-11-20 | Nippon Telegraph And Telephone Public Corporation | Photosensitive resin composition and process for forming photo-resist pattern using the same |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4576999A (en) * | 1982-05-06 | 1986-03-18 | General Electric Company | Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality |
| CN101939360B (zh) * | 2008-02-07 | 2014-06-25 | 新日铁住金化学株式会社 | 有机硅树脂及其制造方法以及含有该有机硅树脂的固化型树脂组合物 |
| MY207473A (en) * | 2019-09-27 | 2025-02-27 | Evonik Operations Gmbh | Silicone (meth)acrylates, process for their preparation and their use in curable compositions |
-
1971
- 1971-10-22 JP JP8372371A patent/JPS5235720B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0164598A3 (en) * | 1984-05-14 | 1986-11-20 | Nippon Telegraph And Telephone Public Corporation | Photosensitive resin composition and process for forming photo-resist pattern using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4848000A (cg-RX-API-DMAC7.html) | 1973-07-07 |