JPS5233478A - Gaseous epitaxial growth process - Google Patents

Gaseous epitaxial growth process

Info

Publication number
JPS5233478A
JPS5233478A JP50110197A JP11019775A JPS5233478A JP S5233478 A JPS5233478 A JP S5233478A JP 50110197 A JP50110197 A JP 50110197A JP 11019775 A JP11019775 A JP 11019775A JP S5233478 A JPS5233478 A JP S5233478A
Authority
JP
Japan
Prior art keywords
epitaxial growth
growth process
gaseous
gaseous epitaxial
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50110197A
Other languages
Japanese (ja)
Inventor
Yukio Kaneko
Yoshiharu Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP50110197A priority Critical patent/JPS5233478A/en
Publication of JPS5233478A publication Critical patent/JPS5233478A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To reduce the number of cleaning and polishing processes which require long period to be completed by one process each, and especially to dissipate fears of pollution which will be caused by abrasives by dispensing with polishing process before the epitaxial growth is obtianed.
JP50110197A 1975-09-10 1975-09-10 Gaseous epitaxial growth process Pending JPS5233478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50110197A JPS5233478A (en) 1975-09-10 1975-09-10 Gaseous epitaxial growth process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50110197A JPS5233478A (en) 1975-09-10 1975-09-10 Gaseous epitaxial growth process

Publications (1)

Publication Number Publication Date
JPS5233478A true JPS5233478A (en) 1977-03-14

Family

ID=14529498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50110197A Pending JPS5233478A (en) 1975-09-10 1975-09-10 Gaseous epitaxial growth process

Country Status (1)

Country Link
JP (1) JPS5233478A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54110183U (en) * 1978-01-20 1979-08-02
JPS61151093A (en) * 1984-12-25 1986-07-09 Nec Corp Vapor-phase epitaxial growth of semiconductor of group iii-v compound
JPS627477A (en) * 1985-07-04 1987-01-14 Toyoda Gosei Co Ltd Method for forming pattern to rubber molded product

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54110183U (en) * 1978-01-20 1979-08-02
JPS61151093A (en) * 1984-12-25 1986-07-09 Nec Corp Vapor-phase epitaxial growth of semiconductor of group iii-v compound
JPS627477A (en) * 1985-07-04 1987-01-14 Toyoda Gosei Co Ltd Method for forming pattern to rubber molded product
JPH034266B2 (en) * 1985-07-04 1991-01-22 Toyoda Gosei Kk

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