JPS5233321B1 - - Google Patents
Info
- Publication number
- JPS5233321B1 JPS5233321B1 JP5135571A JP5135571A JPS5233321B1 JP S5233321 B1 JPS5233321 B1 JP S5233321B1 JP 5135571 A JP5135571 A JP 5135571A JP 5135571 A JP5135571 A JP 5135571A JP S5233321 B1 JPS5233321 B1 JP S5233321B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measuring Volume Flow (AREA)
- Control Of Non-Positive-Displacement Pumps (AREA)
- Control Of Positive-Displacement Air Blowers (AREA)
- Flow Control (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5135571A JPS5233321B1 (en) | 1971-07-10 | 1971-07-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5135571A JPS5233321B1 (en) | 1971-07-10 | 1971-07-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5233321B1 true JPS5233321B1 (en) | 1977-08-27 |
Family
ID=12884606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5135571A Pending JPS5233321B1 (en) | 1971-07-10 | 1971-07-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5233321B1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190117755A (en) | 2017-03-03 | 2019-10-16 | 호야 가부시키가이샤 | Reflective Mask Blanks, Reflective Masks and Methods of Manufacturing Semiconductor Devices |
| KR20220012412A (en) | 2016-03-28 | 2022-02-03 | 호야 가부시키가이샤 | Reflective mask blank, reflective mask and method for manufacturing semiconductor device |
| KR20230053728A (en) | 2021-08-27 | 2023-04-21 | 에이지씨 가부시키가이샤 | Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing reflective mask |
| KR20240025717A (en) | 2017-03-03 | 2024-02-27 | 호야 가부시키가이샤 | Reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
-
1971
- 1971-07-10 JP JP5135571A patent/JPS5233321B1/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220012412A (en) | 2016-03-28 | 2022-02-03 | 호야 가부시키가이샤 | Reflective mask blank, reflective mask and method for manufacturing semiconductor device |
| KR20190117755A (en) | 2017-03-03 | 2019-10-16 | 호야 가부시키가이샤 | Reflective Mask Blanks, Reflective Masks and Methods of Manufacturing Semiconductor Devices |
| US11003068B2 (en) | 2017-03-03 | 2021-05-11 | Hoya Corporation | Reflective mask blank, reflective mask and method of manufacturing semiconductor device |
| KR20240025717A (en) | 2017-03-03 | 2024-02-27 | 호야 가부시키가이샤 | Reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
| KR20230053728A (en) | 2021-08-27 | 2023-04-21 | 에이지씨 가부시키가이샤 | Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing reflective mask |
| KR20240036734A (en) | 2021-08-27 | 2024-03-20 | 에이지씨 가부시키가이샤 | Reflective mask blank, reflective mask, reflective mask blank manufacturing method, and reflective mask manufacturing method |