JPS5232684A - Method of producing parasitic capacity controlled semiconductor device - Google Patents

Method of producing parasitic capacity controlled semiconductor device

Info

Publication number
JPS5232684A
JPS5232684A JP51092403A JP9240376A JPS5232684A JP S5232684 A JPS5232684 A JP S5232684A JP 51092403 A JP51092403 A JP 51092403A JP 9240376 A JP9240376 A JP 9240376A JP S5232684 A JPS5232684 A JP S5232684A
Authority
JP
Japan
Prior art keywords
semiconductor device
parasitic capacity
capacity controlled
controlled semiconductor
producing parasitic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51092403A
Other languages
English (en)
Japanese (ja)
Inventor
Emu Kuuin Robaato
Jiei Shiueru Uiriamu
Ei Yunisu Richiyaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5232684A publication Critical patent/JPS5232684A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2254Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H01L21/2255Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/811Combinations of field-effect devices and one or more diodes, capacitors or resistors
    • H10D84/813Combinations of field-effect devices and capacitor only
    • H10P32/141
    • H10P32/171
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/106Masks, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/117Oxidation, selective
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/157Special diffusion and profiles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Element Separation (AREA)
JP51092403A 1975-09-05 1976-08-04 Method of producing parasitic capacity controlled semiconductor device Pending JPS5232684A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/610,722 US3975220A (en) 1975-09-05 1975-09-05 Diffusion control for controlling parasitic capacitor effects in single FET structure arrays

Publications (1)

Publication Number Publication Date
JPS5232684A true JPS5232684A (en) 1977-03-12

Family

ID=24446154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51092403A Pending JPS5232684A (en) 1975-09-05 1976-08-04 Method of producing parasitic capacity controlled semiconductor device

Country Status (4)

Country Link
US (1) US3975220A (show.php)
JP (1) JPS5232684A (show.php)
DE (1) DE2637310A1 (show.php)
FR (1) FR2323227A1 (show.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4222816A (en) * 1978-12-26 1980-09-16 International Business Machines Corporation Method for reducing parasitic capacitance in integrated circuit structures
JPS5681968A (en) * 1979-12-07 1981-07-04 Toshiba Corp Manufacture of semiconductor device
KR0167271B1 (ko) * 1995-11-30 1998-12-15 문정환 비균등 도우프 채널 구조를 갖는 반도체소자의 제조방법
US6057203A (en) * 1998-06-19 2000-05-02 Programmable Silicon Solutions Integrated circuit capacitor

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3574010A (en) * 1968-12-30 1971-04-06 Texas Instruments Inc Fabrication of metal insulator semiconductor field effect transistors
US3604107A (en) * 1969-04-17 1971-09-14 Collins Radio Co Doped oxide field effect transistors
US3690969A (en) * 1971-05-03 1972-09-12 Motorola Inc Method of doping semiconductor substrates
US3926694A (en) * 1972-07-24 1975-12-16 Signetics Corp Double diffused metal oxide semiconductor structure with isolated source and drain and method
JPS567304B2 (show.php) * 1972-08-28 1981-02-17
US3811076A (en) * 1973-01-02 1974-05-14 Ibm Field effect transistor integrated circuit and memory
US3841926A (en) * 1973-01-02 1974-10-15 Ibm Integrated circuit fabrication process
US3873372A (en) * 1973-07-09 1975-03-25 Ibm Method for producing improved transistor devices

Also Published As

Publication number Publication date
FR2323227B1 (show.php) 1979-05-04
DE2637310A1 (de) 1977-03-10
US3975220A (en) 1976-08-17
FR2323227A1 (fr) 1977-04-01

Similar Documents

Publication Publication Date Title
JPS5236477A (en) Method of producing semiconductor device
JPS51135385A (en) Method of producing semiconductor device
JPS51120184A (en) Method of producing semiconductor device
JPS526088A (en) Method of producing semiconductor device
JPS52113686A (en) Method of producing semiconductor device
JPS5353276A (en) Method of producing semiconductor device
JPS5279668A (en) Method of producing semiconductor device
JPS52137276A (en) Method of producing semiconductor device
JPS5260579A (en) Method of producing semiconductor device
JPS5294781A (en) Method of producing semiconductor device
JPS5321587A (en) Method of producing semiconductor device
JPS5239377A (en) Method of manufacturing semiconductor device
JPS5255375A (en) Method of making semiconductor devices
JPS5310289A (en) Method of producing semiconductor device
JPS52119083A (en) Method of producing semiconductor device
JPS52114276A (en) Method of manufacturing semiconductor device
JPS5222484A (en) Method of producing semiconductor structure
JPS5329666A (en) Method of making semiconductor device
GB1552021A (en) Method of producing semiconductor device
JPS51134576A (en) Method of manufacturing semiconductor device
JPS52141583A (en) Method of producing semiconductor device
JPS5275173A (en) Method of making semiconductor devices
JPS535981A (en) Method of producing semiconductor device
JPS57141971A (en) Method of producing amorphous silicon semiconductor device
JPS5275174A (en) Method of making semiconductor devices