JPS5226216A - Photosensitive resinous composition - Google Patents

Photosensitive resinous composition

Info

Publication number
JPS5226216A
JPS5226216A JP10232975A JP10232975A JPS5226216A JP S5226216 A JPS5226216 A JP S5226216A JP 10232975 A JP10232975 A JP 10232975A JP 10232975 A JP10232975 A JP 10232975A JP S5226216 A JPS5226216 A JP S5226216A
Authority
JP
Japan
Prior art keywords
resinous composition
photosensitive resinous
photosensitive
water
aftor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10232975A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5337215B2 (cs
Inventor
Takahiro Tsunoda
Tsugio Yamaoka
Takeshi Noro
Yoshio Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP10232975A priority Critical patent/JPS5226216A/ja
Publication of JPS5226216A publication Critical patent/JPS5226216A/ja
Publication of JPS5337215B2 publication Critical patent/JPS5337215B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP10232975A 1975-08-23 1975-08-23 Photosensitive resinous composition Granted JPS5226216A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10232975A JPS5226216A (en) 1975-08-23 1975-08-23 Photosensitive resinous composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10232975A JPS5226216A (en) 1975-08-23 1975-08-23 Photosensitive resinous composition

Publications (2)

Publication Number Publication Date
JPS5226216A true JPS5226216A (en) 1977-02-26
JPS5337215B2 JPS5337215B2 (cs) 1978-10-07

Family

ID=14324484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10232975A Granted JPS5226216A (en) 1975-08-23 1975-08-23 Photosensitive resinous composition

Country Status (1)

Country Link
JP (1) JPS5226216A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079349A (ja) * 1983-10-06 1985-05-07 Mitsubishi Chem Ind Ltd 水溶性感光性組成物及び有機カラ−フイルタ−

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5542735U (cs) * 1978-09-14 1980-03-19

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079349A (ja) * 1983-10-06 1985-05-07 Mitsubishi Chem Ind Ltd 水溶性感光性組成物及び有機カラ−フイルタ−

Also Published As

Publication number Publication date
JPS5337215B2 (cs) 1978-10-07

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