JPS5224082A - Production method of semiconductor apparatus - Google Patents

Production method of semiconductor apparatus

Info

Publication number
JPS5224082A
JPS5224082A JP9983175A JP9983175A JPS5224082A JP S5224082 A JPS5224082 A JP S5224082A JP 9983175 A JP9983175 A JP 9983175A JP 9983175 A JP9983175 A JP 9983175A JP S5224082 A JPS5224082 A JP S5224082A
Authority
JP
Japan
Prior art keywords
production method
semiconductor apparatus
formation
time
teratment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9983175A
Other languages
Japanese (ja)
Other versions
JPS5423230B2 (en
Inventor
Yukio Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP9983175A priority Critical patent/JPS5224082A/en
Publication of JPS5224082A publication Critical patent/JPS5224082A/en
Publication of JPS5423230B2 publication Critical patent/JPS5423230B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)

Abstract

PURPOSE: To make uniform the formation of the separation region through the oxide-film separation, together with to reduce the time necessary for the pyrogenetic teratment, further, to perform thechannel stopper formation at one time with good controlability.
COPYRIGHT: (C)1977,JPO&Japio
JP9983175A 1975-08-19 1975-08-19 Production method of semiconductor apparatus Granted JPS5224082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9983175A JPS5224082A (en) 1975-08-19 1975-08-19 Production method of semiconductor apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9983175A JPS5224082A (en) 1975-08-19 1975-08-19 Production method of semiconductor apparatus

Publications (2)

Publication Number Publication Date
JPS5224082A true JPS5224082A (en) 1977-02-23
JPS5423230B2 JPS5423230B2 (en) 1979-08-11

Family

ID=14257749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9983175A Granted JPS5224082A (en) 1975-08-19 1975-08-19 Production method of semiconductor apparatus

Country Status (1)

Country Link
JP (1) JPS5224082A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140645A (en) * 1980-04-02 1981-11-04 Nec Corp Manufacture of semiconductor device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212586A (en) * 1975-07-21 1977-01-31 Nec Corp Production method of semiconductor integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212586A (en) * 1975-07-21 1977-01-31 Nec Corp Production method of semiconductor integrated circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140645A (en) * 1980-04-02 1981-11-04 Nec Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5423230B2 (en) 1979-08-11

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