JPS5218023B2 - - Google Patents
Info
- Publication number
- JPS5218023B2 JPS5218023B2 JP47023342A JP2334272A JPS5218023B2 JP S5218023 B2 JPS5218023 B2 JP S5218023B2 JP 47023342 A JP47023342 A JP 47023342A JP 2334272 A JP2334272 A JP 2334272A JP S5218023 B2 JPS5218023 B2 JP S5218023B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47023342A JPS5218023B2 (nl) | 1972-03-07 | 1972-03-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47023342A JPS5218023B2 (nl) | 1972-03-07 | 1972-03-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4890739A JPS4890739A (nl) | 1973-11-27 |
| JPS5218023B2 true JPS5218023B2 (nl) | 1977-05-19 |
Family
ID=12107905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47023342A Expired JPS5218023B2 (nl) | 1972-03-07 | 1972-03-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5218023B2 (nl) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58148777U (ja) * | 1982-03-30 | 1983-10-06 | 株式会社サンペツクス | カ−トリツジにおけるテ−プの逆回転防止構造 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50117901U (nl) * | 1974-03-08 | 1975-09-26 | ||
| JPS50134771A (nl) * | 1974-04-03 | 1975-10-25 | ||
| JPS50129202U (nl) * | 1974-04-05 | 1975-10-23 | ||
| JPS5922218B2 (ja) * | 1975-04-30 | 1984-05-25 | 富士写真フイルム株式会社 | 印刷原版用感光材料 |
| JPS54143231A (en) * | 1978-04-28 | 1979-11-08 | Hitachi Chemical Co Ltd | Method of fabricating photoresist image |
| JPS5887147U (ja) * | 1981-12-08 | 1983-06-13 | 日本コロムビア株式会社 | フオトレジストマスタ−盤 |
| NL8500455A (nl) * | 1985-02-18 | 1986-09-16 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij een fotolakmasker wordt gevormd met behulp van een twee-laags-laksysteem. |
| NL8601096A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak. |
| JP6079109B2 (ja) * | 2012-10-04 | 2017-02-15 | 住友化学株式会社 | 保護膜の製造方法 |
-
1972
- 1972-03-07 JP JP47023342A patent/JPS5218023B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58148777U (ja) * | 1982-03-30 | 1983-10-06 | 株式会社サンペツクス | カ−トリツジにおけるテ−プの逆回転防止構造 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4890739A (nl) | 1973-11-27 |