JPS5218023B2 - - Google Patents

Info

Publication number
JPS5218023B2
JPS5218023B2 JP47023342A JP2334272A JPS5218023B2 JP S5218023 B2 JPS5218023 B2 JP S5218023B2 JP 47023342 A JP47023342 A JP 47023342A JP 2334272 A JP2334272 A JP 2334272A JP S5218023 B2 JPS5218023 B2 JP S5218023B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP47023342A
Other languages
Japanese (ja)
Other versions
JPS4890739A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47023342A priority Critical patent/JPS5218023B2/ja
Publication of JPS4890739A publication Critical patent/JPS4890739A/ja
Publication of JPS5218023B2 publication Critical patent/JPS5218023B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP47023342A 1972-03-07 1972-03-07 Expired JPS5218023B2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP47023342A JPS5218023B2 (enrdf_load_stackoverflow) 1972-03-07 1972-03-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47023342A JPS5218023B2 (enrdf_load_stackoverflow) 1972-03-07 1972-03-07

Publications (2)

Publication Number Publication Date
JPS4890739A JPS4890739A (enrdf_load_stackoverflow) 1973-11-27
JPS5218023B2 true JPS5218023B2 (enrdf_load_stackoverflow) 1977-05-19

Family

ID=12107905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47023342A Expired JPS5218023B2 (enrdf_load_stackoverflow) 1972-03-07 1972-03-07

Country Status (1)

Country Link
JP (1) JPS5218023B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58148777U (ja) * 1982-03-30 1983-10-06 株式会社サンペツクス カ−トリツジにおけるテ−プの逆回転防止構造

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50117901U (enrdf_load_stackoverflow) * 1974-03-08 1975-09-26
JPS50134771A (enrdf_load_stackoverflow) * 1974-04-03 1975-10-25
JPS50129202U (enrdf_load_stackoverflow) * 1974-04-05 1975-10-23
JPS5922218B2 (ja) * 1975-04-30 1984-05-25 富士写真フイルム株式会社 印刷原版用感光材料
JPS54143231A (en) * 1978-04-28 1979-11-08 Hitachi Chemical Co Ltd Method of fabricating photoresist image
JPS5887147U (ja) * 1981-12-08 1983-06-13 日本コロムビア株式会社 フオトレジストマスタ−盤
NL8500455A (nl) * 1985-02-18 1986-09-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij een fotolakmasker wordt gevormd met behulp van een twee-laags-laksysteem.
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
JP6079109B2 (ja) * 2012-10-04 2017-02-15 住友化学株式会社 保護膜の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58148777U (ja) * 1982-03-30 1983-10-06 株式会社サンペツクス カ−トリツジにおけるテ−プの逆回転防止構造

Also Published As

Publication number Publication date
JPS4890739A (enrdf_load_stackoverflow) 1973-11-27

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