JPS5215321A - Photosensitive resinous composition - Google Patents

Photosensitive resinous composition

Info

Publication number
JPS5215321A
JPS5215321A JP9112175A JP9112175A JPS5215321A JP S5215321 A JPS5215321 A JP S5215321A JP 9112175 A JP9112175 A JP 9112175A JP 9112175 A JP9112175 A JP 9112175A JP S5215321 A JPS5215321 A JP S5215321A
Authority
JP
Japan
Prior art keywords
resinous composition
photosensitive resinous
photosensitive
dichromate
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9112175A
Other languages
English (en)
Other versions
JPS5410858B2 (ja
Inventor
Yoichi Oba
Yasuhide Kashiwakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9112175A priority Critical patent/JPS5215321A/ja
Priority to DE19762633949 priority patent/DE2633949A1/de
Publication of JPS5215321A publication Critical patent/JPS5215321A/ja
Publication of JPS5410858B2 publication Critical patent/JPS5410858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP9112175A 1975-07-28 1975-07-28 Photosensitive resinous composition Granted JPS5215321A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9112175A JPS5215321A (en) 1975-07-28 1975-07-28 Photosensitive resinous composition
DE19762633949 DE2633949A1 (de) 1975-07-28 1976-07-28 Lichtempfindliche harzmasse

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9112175A JPS5215321A (en) 1975-07-28 1975-07-28 Photosensitive resinous composition

Publications (2)

Publication Number Publication Date
JPS5215321A true JPS5215321A (en) 1977-02-04
JPS5410858B2 JPS5410858B2 (ja) 1979-05-10

Family

ID=14017684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9112175A Granted JPS5215321A (en) 1975-07-28 1975-07-28 Photosensitive resinous composition

Country Status (2)

Country Link
JP (1) JPS5215321A (ja)
DE (1) DE2633949A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61180233A (ja) * 1985-02-06 1986-08-12 Dainippon Screen Mfg Co Ltd 銅又は銅合金からなる基材表面への耐食性皮膜の形成方法
US5230969A (en) * 1990-08-09 1993-07-27 Physical Optics Corporation Composite graft optical polymer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61180233A (ja) * 1985-02-06 1986-08-12 Dainippon Screen Mfg Co Ltd 銅又は銅合金からなる基材表面への耐食性皮膜の形成方法
JPH0584512B2 (ja) * 1985-02-06 1993-12-02 Dainippon Screen Mfg
US5230969A (en) * 1990-08-09 1993-07-27 Physical Optics Corporation Composite graft optical polymer

Also Published As

Publication number Publication date
DE2633949A1 (de) 1977-02-03
JPS5410858B2 (ja) 1979-05-10

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