JPS52149606A - Pump - Google Patents
PumpInfo
- Publication number
- JPS52149606A JPS52149606A JP6660176A JP6660176A JPS52149606A JP S52149606 A JPS52149606 A JP S52149606A JP 6660176 A JP6660176 A JP 6660176A JP 6660176 A JP6660176 A JP 6660176A JP S52149606 A JPS52149606 A JP S52149606A
- Authority
- JP
- Japan
- Prior art keywords
- pump
- furnish
- idea
- easy assembly
- disassembly work
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: The idea is to furnish a pump of easy assembly and disassembly work.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6660176A JPS52149606A (en) | 1976-06-09 | 1976-06-09 | Pump |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6660176A JPS52149606A (en) | 1976-06-09 | 1976-06-09 | Pump |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52149606A true JPS52149606A (en) | 1977-12-12 |
Family
ID=13320591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6660176A Pending JPS52149606A (en) | 1976-06-09 | 1976-06-09 | Pump |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52149606A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5960555A (en) * | 1996-07-24 | 1999-10-05 | Applied Materials, Inc. | Method and apparatus for purging the back side of a substrate during chemical vapor processing |
-
1976
- 1976-06-09 JP JP6660176A patent/JPS52149606A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5960555A (en) * | 1996-07-24 | 1999-10-05 | Applied Materials, Inc. | Method and apparatus for purging the back side of a substrate during chemical vapor processing |
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