JPS52146251A - Production and apparatus of optical interference filters - Google Patents
Production and apparatus of optical interference filtersInfo
- Publication number
- JPS52146251A JPS52146251A JP6230776A JP6230776A JPS52146251A JP S52146251 A JPS52146251 A JP S52146251A JP 6230776 A JP6230776 A JP 6230776A JP 6230776 A JP6230776 A JP 6230776A JP S52146251 A JPS52146251 A JP S52146251A
- Authority
- JP
- Japan
- Prior art keywords
- production
- optical interference
- interference filters
- films
- deposition rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title 1
- 238000000151 deposition Methods 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- 230000003595 spectral effect Effects 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Filters (AREA)
- Physical Vapour Deposition (AREA)
- Color Television Image Signal Generators (AREA)
Abstract
PURPOSE:To control the deposition rate of films and stabilize spectral characteristics by using a high frequency sputtering method and electrically detecting parameters that affect the deposition rate of films.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6230776A JPS52146251A (en) | 1976-05-31 | 1976-05-31 | Production and apparatus of optical interference filters |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6230776A JPS52146251A (en) | 1976-05-31 | 1976-05-31 | Production and apparatus of optical interference filters |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52146251A true JPS52146251A (en) | 1977-12-05 |
Family
ID=13196340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6230776A Pending JPS52146251A (en) | 1976-05-31 | 1976-05-31 | Production and apparatus of optical interference filters |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52146251A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01108373A (en) * | 1987-09-18 | 1989-04-25 | Leybold Ag | Apparatus for coating base plate |
JPH02115366A (en) * | 1988-10-25 | 1990-04-27 | Sumitomo Special Metals Co Ltd | Sputtering device |
-
1976
- 1976-05-31 JP JP6230776A patent/JPS52146251A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01108373A (en) * | 1987-09-18 | 1989-04-25 | Leybold Ag | Apparatus for coating base plate |
JPH02115366A (en) * | 1988-10-25 | 1990-04-27 | Sumitomo Special Metals Co Ltd | Sputtering device |
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