Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co LtdfiledCriticalToshiba Corp
Priority to JP6227576ApriorityCriticalpatent/JPS52145375A/en
Publication of JPS52145375ApublicationCriticalpatent/JPS52145375A/en
Vaporization, Distillation, Condensation, Sublimation, And Cold Traps
(AREA)
Physical Or Chemical Processes And Apparatus
(AREA)
Abstract
PURPOSE: To remove the reactive gas at a high rate and to prevent the reactive gas from flowing out of the system by reacting the gas (such as UF6) with spray of water etc. in the second reaction chamber formed between a single cylindrical reaction vessel and the first cylindrical reaction chamber installed coaxially in the reaction vessel.
COPYRIGHT: (C)1977,JPO&Japio
JP6227576A1976-05-311976-05-31Apparatus for treating reactive gas
PendingJPS52145375A
(en)