JPS5213716B2 - - Google Patents

Info

Publication number
JPS5213716B2
JPS5213716B2 JP46104403A JP10440371A JPS5213716B2 JP S5213716 B2 JPS5213716 B2 JP S5213716B2 JP 46104403 A JP46104403 A JP 46104403A JP 10440371 A JP10440371 A JP 10440371A JP S5213716 B2 JPS5213716 B2 JP S5213716B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP46104403A
Other languages
Japanese (ja)
Other versions
JPS4869480A (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46104403A priority Critical patent/JPS5213716B2/ja
Priority to US05/316,579 priority patent/US3938178A/en
Publication of JPS4869480A publication Critical patent/JPS4869480A/ja
Publication of JPS5213716B2 publication Critical patent/JPS5213716B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/023Deep level dopants
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/904Charge carrier lifetime control

Landscapes

  • Bipolar Transistors (AREA)
  • Thyristors (AREA)
JP46104403A 1971-12-22 1971-12-22 Expired JPS5213716B2 (https=)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP46104403A JPS5213716B2 (https=) 1971-12-22 1971-12-22
US05/316,579 US3938178A (en) 1971-12-22 1972-12-19 Process for treatment of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46104403A JPS5213716B2 (https=) 1971-12-22 1971-12-22

Publications (2)

Publication Number Publication Date
JPS4869480A JPS4869480A (https=) 1973-09-20
JPS5213716B2 true JPS5213716B2 (https=) 1977-04-16

Family

ID=14379738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46104403A Expired JPS5213716B2 (https=) 1971-12-22 1971-12-22

Country Status (2)

Country Link
US (1) US3938178A (https=)
JP (1) JPS5213716B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5395581A (en) * 1977-02-02 1978-08-21 Hitachi Ltd Manufacture for semiconductor device
JPS54150692U (https=) * 1978-04-12 1979-10-19
US5098864A (en) * 1989-11-29 1992-03-24 Olin Corporation Process for manufacturing a metal pin grid array package
JPH0472736A (ja) * 1990-07-13 1992-03-06 Mitsubishi Electric Corp 半導体装置の製造方法
JP3171043B2 (ja) * 1995-01-11 2001-05-28 株式会社村田製作所 弾性表面波装置
US6674064B1 (en) 2001-07-18 2004-01-06 University Of Central Florida Method and system for performance improvement of photodetectors and solar cells
DE102010026344A1 (de) * 2010-07-07 2012-01-12 Osram Opto Semiconductors Gmbh Leuchtdiode
US10319654B1 (en) * 2017-12-01 2019-06-11 Cubic Corporation Integrated chip scale packages

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3540925A (en) * 1967-08-02 1970-11-17 Rca Corp Ion bombardment of insulated gate semiconductor devices
US3595716A (en) * 1968-05-16 1971-07-27 Philips Corp Method of manufacturing semiconductor devices
NL6919560A (https=) * 1969-01-31 1970-08-04
US3590471A (en) * 1969-02-04 1971-07-06 Bell Telephone Labor Inc Fabrication of insulated gate field-effect transistors involving ion implantation
US3622382A (en) * 1969-05-05 1971-11-23 Ibm Semiconductor isolation structure and method of producing

Also Published As

Publication number Publication date
US3938178A (en) 1976-02-10
JPS4869480A (https=) 1973-09-20

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