JPS52132782A - Apparatus for aligning position of object - Google Patents

Apparatus for aligning position of object

Info

Publication number
JPS52132782A
JPS52132782A JP4857277A JP4857277A JPS52132782A JP S52132782 A JPS52132782 A JP S52132782A JP 4857277 A JP4857277 A JP 4857277A JP 4857277 A JP4857277 A JP 4857277A JP S52132782 A JPS52132782 A JP S52132782A
Authority
JP
Japan
Prior art keywords
aligning position
aligning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4857277A
Other languages
Japanese (ja)
Inventor
Harutsungu Sutefuan
Yakushiyu Eruharudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of JPS52132782A publication Critical patent/JPS52132782A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • B23Q1/36—Springs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Machine Tool Units (AREA)
JP4857277A 1976-04-29 1977-04-28 Apparatus for aligning position of object Pending JPS52132782A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19258376A DD136671A1 (en) 1976-04-29 1976-04-29 TAX MECHANISM FOR POSITIONING AN ITEM, ESPECIALLY FOR FINE POSITIONING OF SUBSTRATE DISCS

Publications (1)

Publication Number Publication Date
JPS52132782A true JPS52132782A (en) 1977-11-07

Family

ID=5504355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4857277A Pending JPS52132782A (en) 1976-04-29 1977-04-28 Apparatus for aligning position of object

Country Status (4)

Country Link
JP (1) JPS52132782A (en)
DD (1) DD136671A1 (en)
DE (1) DE2708548A1 (en)
FR (1) FR2349405A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0051588B1 (en) * 1980-01-17 1986-11-05 JACKSON, Brian Laurence Rotary microtome drive
CH633740A5 (en) * 1980-01-25 1982-12-31 Charmilles Sa Ateliers MACHINE TOOL COMPRISING A MOBILE TABLE.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3685117A (en) * 1970-05-12 1972-08-22 Jade Corp Alignment fixture
FR2146106B1 (en) * 1971-07-16 1977-08-05 Thomson Csf
US3885877A (en) * 1973-10-11 1975-05-27 Ibm Electro-optical fine alignment process

Also Published As

Publication number Publication date
DD136671A1 (en) 1979-07-18
FR2349405A1 (en) 1977-11-25
DE2708548A1 (en) 1977-11-10

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