JPS52126174A - Microwave discharge device - Google Patents
Microwave discharge deviceInfo
- Publication number
- JPS52126174A JPS52126174A JP4278776A JP4278776A JPS52126174A JP S52126174 A JPS52126174 A JP S52126174A JP 4278776 A JP4278776 A JP 4278776A JP 4278776 A JP4278776 A JP 4278776A JP S52126174 A JPS52126174 A JP S52126174A
- Authority
- JP
- Japan
- Prior art keywords
- discharge device
- microwave discharge
- microwave
- forming
- circular waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4278776A JPS52126174A (en) | 1976-04-15 | 1976-04-15 | Microwave discharge device |
| GB15644/77A GB1523267A (en) | 1976-04-15 | 1977-04-14 | Plasma etching apparatus |
| DE2716592A DE2716592C3 (de) | 1976-04-15 | 1977-04-14 | Plasma-Ätzvorrichtung |
| US05/787,878 US4101411A (en) | 1976-04-15 | 1977-04-15 | Plasma etching apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4278776A JPS52126174A (en) | 1976-04-15 | 1976-04-15 | Microwave discharge device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52126174A true JPS52126174A (en) | 1977-10-22 |
| JPS5334461B2 JPS5334461B2 (Direct) | 1978-09-20 |
Family
ID=12645665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4278776A Granted JPS52126174A (en) | 1976-04-15 | 1976-04-15 | Microwave discharge device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52126174A (Direct) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5875839A (ja) * | 1981-10-30 | 1983-05-07 | Fujitsu Ltd | スパツタ装置 |
| JPS63318127A (ja) * | 1987-06-19 | 1988-12-27 | Sumitomo Metal Ind Ltd | プラズマプロセス装置 |
| JPH03500706A (ja) * | 1987-06-22 | 1991-02-14 | アプライド サイエンス アンド テクノロジー,インコーポレーテッド | マイクロウェーブプラズマ発生器 |
| US5242539A (en) * | 1991-04-04 | 1993-09-07 | Hitachi, Ltd. | Plasma treatment method and apparatus |
| US5368685A (en) * | 1992-03-24 | 1994-11-29 | Hitachi, Ltd. | Dry etching apparatus and method |
-
1976
- 1976-04-15 JP JP4278776A patent/JPS52126174A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5875839A (ja) * | 1981-10-30 | 1983-05-07 | Fujitsu Ltd | スパツタ装置 |
| JPS63318127A (ja) * | 1987-06-19 | 1988-12-27 | Sumitomo Metal Ind Ltd | プラズマプロセス装置 |
| JPH03500706A (ja) * | 1987-06-22 | 1991-02-14 | アプライド サイエンス アンド テクノロジー,インコーポレーテッド | マイクロウェーブプラズマ発生器 |
| US5242539A (en) * | 1991-04-04 | 1993-09-07 | Hitachi, Ltd. | Plasma treatment method and apparatus |
| US5368685A (en) * | 1992-03-24 | 1994-11-29 | Hitachi, Ltd. | Dry etching apparatus and method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5334461B2 (Direct) | 1978-09-20 |
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