JPS52112196A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS52112196A
JPS52112196A JP2849776A JP2849776A JPS52112196A JP S52112196 A JPS52112196 A JP S52112196A JP 2849776 A JP2849776 A JP 2849776A JP 2849776 A JP2849776 A JP 2849776A JP S52112196 A JPS52112196 A JP S52112196A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
patterns
microsize
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2849776A
Other languages
Japanese (ja)
Other versions
JPS548071B2 (en
Inventor
Hiroshi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2849776A priority Critical patent/JPS52112196A/en
Publication of JPS52112196A publication Critical patent/JPS52112196A/en
Publication of JPS548071B2 publication Critical patent/JPS548071B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:In the electron beam exposure apparatus for use in forming microsize patterns, to shorten the time required per unit area by applying scanning shaped like a belt with a certain width, and, at the same time, to prevent the patterns from being deformed.
JP2849776A 1976-03-16 1976-03-16 Electron beam exposure apparatus Granted JPS52112196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2849776A JPS52112196A (en) 1976-03-16 1976-03-16 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2849776A JPS52112196A (en) 1976-03-16 1976-03-16 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS52112196A true JPS52112196A (en) 1977-09-20
JPS548071B2 JPS548071B2 (en) 1979-04-12

Family

ID=12250299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2849776A Granted JPS52112196A (en) 1976-03-16 1976-03-16 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS52112196A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
EP0367496A2 (en) * 1988-10-31 1990-05-09 Fujitsu Limited Charged particle beam lithography system and a method thereof
US5173582A (en) * 1988-10-31 1992-12-22 Fujitsu Limited Charged particle beam lithography system and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS626341B2 (en) * 1977-10-29 1987-02-10 Nippon Avionics Co Ltd
EP0367496A2 (en) * 1988-10-31 1990-05-09 Fujitsu Limited Charged particle beam lithography system and a method thereof
US5173582A (en) * 1988-10-31 1992-12-22 Fujitsu Limited Charged particle beam lithography system and method

Also Published As

Publication number Publication date
JPS548071B2 (en) 1979-04-12

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