JPS52111747U - - Google Patents
Info
- Publication number
- JPS52111747U JPS52111747U JP1975776U JP1975776U JPS52111747U JP S52111747 U JPS52111747 U JP S52111747U JP 1975776 U JP1975776 U JP 1975776U JP 1975776 U JP1975776 U JP 1975776U JP S52111747 U JPS52111747 U JP S52111747U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1975776U JPS559634Y2 (en) | 1976-02-20 | 1976-02-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1975776U JPS559634Y2 (en) | 1976-02-20 | 1976-02-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52111747U true JPS52111747U (en) | 1977-08-25 |
| JPS559634Y2 JPS559634Y2 (en) | 1980-03-03 |
Family
ID=28479803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1975776U Expired JPS559634Y2 (en) | 1976-02-20 | 1976-02-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559634Y2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5528386A (en) * | 1978-08-21 | 1980-02-28 | Vac Tec Syst | Magnetron sputter apparatus |
| JPS56152963A (en) * | 1980-04-30 | 1981-11-26 | Hitachi Ltd | Sputtering apparatus |
| JPS6180825A (en) * | 1984-09-28 | 1986-04-24 | Hitachi Ltd | Liquid processing device |
| WO2016136121A1 (en) * | 2015-02-24 | 2016-09-01 | 株式会社アルバック | Rotary cathode unit for magnetron sputtering apparatuses |
-
1976
- 1976-02-20 JP JP1975776U patent/JPS559634Y2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5528386A (en) * | 1978-08-21 | 1980-02-28 | Vac Tec Syst | Magnetron sputter apparatus |
| JPS56152963A (en) * | 1980-04-30 | 1981-11-26 | Hitachi Ltd | Sputtering apparatus |
| JPS6180825A (en) * | 1984-09-28 | 1986-04-24 | Hitachi Ltd | Liquid processing device |
| WO2016136121A1 (en) * | 2015-02-24 | 2016-09-01 | 株式会社アルバック | Rotary cathode unit for magnetron sputtering apparatuses |
| JPWO2016136121A1 (en) * | 2015-02-24 | 2017-08-31 | 株式会社アルバック | Rotary cathode unit for magnetron sputtering equipment |
| CN107250427A (en) * | 2015-02-24 | 2017-10-13 | 株式会社爱发科 | Magnetic controlled tube sputtering apparatus rotary cathode unit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS559634Y2 (en) | 1980-03-03 |