JPS5193875A - - Google Patents
Info
- Publication number
- JPS5193875A JPS5193875A JP1920975A JP1920975A JPS5193875A JP S5193875 A JPS5193875 A JP S5193875A JP 1920975 A JP1920975 A JP 1920975A JP 1920975 A JP1920975 A JP 1920975A JP S5193875 A JPS5193875 A JP S5193875A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1920975A JPS5322426B2 (en:Method) | 1975-02-15 | 1975-02-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1920975A JPS5322426B2 (en:Method) | 1975-02-15 | 1975-02-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5193875A true JPS5193875A (en:Method) | 1976-08-17 |
| JPS5322426B2 JPS5322426B2 (en:Method) | 1978-07-08 |
Family
ID=11992965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1920975A Expired JPS5322426B2 (en:Method) | 1975-02-15 | 1975-02-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5322426B2 (en:Method) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51105271A (en:Method) * | 1975-03-13 | 1976-09-17 | Ulvac Corp | |
| JPS5352073A (en) * | 1976-10-22 | 1978-05-12 | Hoya Denshi Kk | Photomask for ic |
| JPS53151470U (en:Method) * | 1977-05-04 | 1978-11-29 | ||
| JPS55121441A (en) * | 1979-03-14 | 1980-09-18 | Fujitsu Ltd | Mask for far ultraviolet exposure |
| JPS5664342A (en) * | 1979-10-29 | 1981-06-01 | Ulvac Corp | Photomask original plate having protective film on reverse side |
| JPS6252550A (ja) * | 1985-08-30 | 1987-03-07 | Mitsubishi Electric Corp | フオトマスク材料 |
| JPS6332553A (ja) * | 1986-07-25 | 1988-02-12 | Hoya Corp | フオトマスクブランクとフオトマスク |
| JPS6333124U (en:Method) * | 1987-08-07 | 1988-03-03 |
-
1975
- 1975-02-15 JP JP1920975A patent/JPS5322426B2/ja not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51105271A (en:Method) * | 1975-03-13 | 1976-09-17 | Ulvac Corp | |
| JPS5352073A (en) * | 1976-10-22 | 1978-05-12 | Hoya Denshi Kk | Photomask for ic |
| JPS53151470U (en:Method) * | 1977-05-04 | 1978-11-29 | ||
| JPS55121441A (en) * | 1979-03-14 | 1980-09-18 | Fujitsu Ltd | Mask for far ultraviolet exposure |
| JPS5664342A (en) * | 1979-10-29 | 1981-06-01 | Ulvac Corp | Photomask original plate having protective film on reverse side |
| JPS6252550A (ja) * | 1985-08-30 | 1987-03-07 | Mitsubishi Electric Corp | フオトマスク材料 |
| JPS6332553A (ja) * | 1986-07-25 | 1988-02-12 | Hoya Corp | フオトマスクブランクとフオトマスク |
| JPS6333124U (en:Method) * | 1987-08-07 | 1988-03-03 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5322426B2 (en:Method) | 1978-07-08 |