JPS5193280A - - Google Patents
Info
- Publication number
- JPS5193280A JPS5193280A JP50017926A JP1792675A JPS5193280A JP S5193280 A JPS5193280 A JP S5193280A JP 50017926 A JP50017926 A JP 50017926A JP 1792675 A JP1792675 A JP 1792675A JP S5193280 A JPS5193280 A JP S5193280A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50017926A JPS5193280A (en) | 1975-02-14 | 1975-02-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50017926A JPS5193280A (en) | 1975-02-14 | 1975-02-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5193280A true JPS5193280A (en) | 1976-08-16 |
Family
ID=11957363
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50017926A Pending JPS5193280A (en) | 1975-02-14 | 1975-02-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5193280A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58195961U (en) * | 1982-06-21 | 1983-12-26 | 日新ハイボルテ−ジ株式会社 | ion source device |
| JPS60120525A (en) * | 1983-12-02 | 1985-06-28 | Nippon Telegr & Teleph Corp <Ntt> | Method for reactive ion etching |
| JPS61107643A (en) * | 1984-10-30 | 1986-05-26 | Hitachi Ltd | Ion source with evaporator furnace |
-
1975
- 1975-02-14 JP JP50017926A patent/JPS5193280A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58195961U (en) * | 1982-06-21 | 1983-12-26 | 日新ハイボルテ−ジ株式会社 | ion source device |
| JPS6328515Y2 (en) * | 1982-06-21 | 1988-08-01 | ||
| JPS60120525A (en) * | 1983-12-02 | 1985-06-28 | Nippon Telegr & Teleph Corp <Ntt> | Method for reactive ion etching |
| JPH0458176B2 (en) * | 1983-12-02 | 1992-09-16 | Nippon Telegraph & Telephone | |
| JPS61107643A (en) * | 1984-10-30 | 1986-05-26 | Hitachi Ltd | Ion source with evaporator furnace |
| JPH0531260B2 (en) * | 1984-10-30 | 1993-05-12 | Hitachi Ltd |