JPS5190274A - Fuotomasukuno seizohoho - Google Patents

Fuotomasukuno seizohoho

Info

Publication number
JPS5190274A
JPS5190274A JP1565275A JP1565275A JPS5190274A JP S5190274 A JPS5190274 A JP S5190274A JP 1565275 A JP1565275 A JP 1565275A JP 1565275 A JP1565275 A JP 1565275A JP S5190274 A JPS5190274 A JP S5190274A
Authority
JP
Japan
Prior art keywords
fuotomasukuno
seizohoho
fuotomasukuno seizohoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1565275A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5322425B2 (cg-RX-API-DMAC10.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1565275A priority Critical patent/JPS5190274A/ja
Publication of JPS5190274A publication Critical patent/JPS5190274A/ja
Publication of JPS5322425B2 publication Critical patent/JPS5322425B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1565275A 1975-02-05 1975-02-05 Fuotomasukuno seizohoho Granted JPS5190274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1565275A JPS5190274A (en) 1975-02-05 1975-02-05 Fuotomasukuno seizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1565275A JPS5190274A (en) 1975-02-05 1975-02-05 Fuotomasukuno seizohoho

Publications (2)

Publication Number Publication Date
JPS5190274A true JPS5190274A (en) 1976-08-07
JPS5322425B2 JPS5322425B2 (cg-RX-API-DMAC10.html) 1978-07-08

Family

ID=11894639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1565275A Granted JPS5190274A (en) 1975-02-05 1975-02-05 Fuotomasukuno seizohoho

Country Status (1)

Country Link
JP (1) JPS5190274A (cg-RX-API-DMAC10.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154735A (en) * 1979-05-22 1980-12-02 Sharp Corp Manufacture of semiconductor device
JPH0333848A (ja) * 1989-06-30 1991-02-14 Sony Corp クロム系膜のパターン形成方法
US6544894B1 (en) 1999-01-26 2003-04-08 Sharp Kabushiki Kaisha Method of producing chromium mask

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4975270A (cg-RX-API-DMAC10.html) * 1972-11-22 1974-07-19
US3837856A (en) * 1967-04-04 1974-09-24 Signetics Corp Method for removing photoresist in manufacture of semiconductor devices
JPS5080082A (cg-RX-API-DMAC10.html) * 1973-11-12 1975-06-28

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3837856A (en) * 1967-04-04 1974-09-24 Signetics Corp Method for removing photoresist in manufacture of semiconductor devices
JPS4975270A (cg-RX-API-DMAC10.html) * 1972-11-22 1974-07-19
JPS5080082A (cg-RX-API-DMAC10.html) * 1973-11-12 1975-06-28

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154735A (en) * 1979-05-22 1980-12-02 Sharp Corp Manufacture of semiconductor device
JPH0333848A (ja) * 1989-06-30 1991-02-14 Sony Corp クロム系膜のパターン形成方法
US6544894B1 (en) 1999-01-26 2003-04-08 Sharp Kabushiki Kaisha Method of producing chromium mask

Also Published As

Publication number Publication date
JPS5322425B2 (cg-RX-API-DMAC10.html) 1978-07-08

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