JPS5180419U - - Google Patents
Info
- Publication number
- JPS5180419U JPS5180419U JP15525074U JP15525074U JPS5180419U JP S5180419 U JPS5180419 U JP S5180419U JP 15525074 U JP15525074 U JP 15525074U JP 15525074 U JP15525074 U JP 15525074U JP S5180419 U JPS5180419 U JP S5180419U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Soil Working Implements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15525074U JPS5422649Y2 (en) | 1974-12-20 | 1974-12-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15525074U JPS5422649Y2 (en) | 1974-12-20 | 1974-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5180419U true JPS5180419U (en) | 1976-06-26 |
| JPS5422649Y2 JPS5422649Y2 (en) | 1979-08-07 |
Family
ID=28446556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15525074U Expired JPS5422649Y2 (en) | 1974-12-20 | 1974-12-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5422649Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102580204B1 (en) | 2023-03-02 | 2023-09-19 | (주)오로스 테크놀로지 | Overlay Mark for One-dimensional Overlay Measurement, Optical Aberration Evaluation Method, Overlay Mark Quality Evaluation Method, Overlay Measurement Device, Overlay Measurement Method, and Semiconductor Device Manufacturing Method Using the Same |
-
1974
- 1974-12-20 JP JP15525074U patent/JPS5422649Y2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102580204B1 (en) | 2023-03-02 | 2023-09-19 | (주)오로스 테크놀로지 | Overlay Mark for One-dimensional Overlay Measurement, Optical Aberration Evaluation Method, Overlay Mark Quality Evaluation Method, Overlay Measurement Device, Overlay Measurement Method, and Semiconductor Device Manufacturing Method Using the Same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5422649Y2 (en) | 1979-08-07 |