JPS517993A - - Google Patents
Info
- Publication number
- JPS517993A JPS517993A JP49078306A JP7830674A JPS517993A JP S517993 A JPS517993 A JP S517993A JP 49078306 A JP49078306 A JP 49078306A JP 7830674 A JP7830674 A JP 7830674A JP S517993 A JPS517993 A JP S517993A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49078306A JPS517993A (ja) | 1974-07-10 | 1974-07-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49078306A JPS517993A (ja) | 1974-07-10 | 1974-07-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS517993A true JPS517993A (ja) | 1976-01-22 |
Family
ID=13658233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49078306A Pending JPS517993A (ja) | 1974-07-10 | 1974-07-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS517993A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6060707A (en) * | 1996-11-26 | 2000-05-09 | Sharp Kabushiki Kaisha | Apparatus and method for analyzing microscopic area |
| KR20210127994A (ko) * | 2019-10-30 | 2021-10-25 | 양쯔 메모리 테크놀로지스 씨오., 엘티디. | 반도체 제조공정에 적용되는 입자빔의 수직도 보정 방법 및 시스템 |
-
1974
- 1974-07-10 JP JP49078306A patent/JPS517993A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6060707A (en) * | 1996-11-26 | 2000-05-09 | Sharp Kabushiki Kaisha | Apparatus and method for analyzing microscopic area |
| KR20210127994A (ko) * | 2019-10-30 | 2021-10-25 | 양쯔 메모리 테크놀로지스 씨오., 엘티디. | 반도체 제조공정에 적용되는 입자빔의 수직도 보정 방법 및 시스템 |
| JP2022528332A (ja) * | 2019-10-30 | 2022-06-10 | 長江存儲科技有限責任公司 | 粒子線の垂直性を較正するための方法および半導体製造プロセスに適用されるシステム |