JPS5160454A - - Google Patents

Info

Publication number
JPS5160454A
JPS5160454A JP49133665A JP13366574A JPS5160454A JP S5160454 A JPS5160454 A JP S5160454A JP 49133665 A JP49133665 A JP 49133665A JP 13366574 A JP13366574 A JP 13366574A JP S5160454 A JPS5160454 A JP S5160454A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49133665A
Other languages
Japanese (ja)
Inventor
Keizo Inaniwa
Shuichi Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP49133665A priority Critical patent/JPS5160454A/ja
Publication of JPS5160454A publication Critical patent/JPS5160454A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
JP49133665A 1974-11-22 1974-11-22 Pending JPS5160454A (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49133665A JPS5160454A (enExample) 1974-11-22 1974-11-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49133665A JPS5160454A (enExample) 1974-11-22 1974-11-22

Publications (1)

Publication Number Publication Date
JPS5160454A true JPS5160454A (enExample) 1976-05-26

Family

ID=15110048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49133665A Pending JPS5160454A (enExample) 1974-11-22 1974-11-22

Country Status (1)

Country Link
JP (1) JPS5160454A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113229A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Forming method for insulating film
JPS59159533A (ja) * 1983-03-03 1984-09-10 Toshiba Corp 半導体装置の製造方法
US5362526A (en) * 1986-12-19 1994-11-08 Applied Materials, Inc. Plasma-enhanced CVD process using TEOS for depositing silicon oxide
US5755886A (en) * 1986-12-19 1998-05-26 Applied Materials, Inc. Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615941A (en) * 1968-05-07 1971-10-26 Hitachi Ltd Method for manufacturing semiconductor device with passivation film
JPS4866777A (enExample) * 1971-12-15 1973-09-12

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615941A (en) * 1968-05-07 1971-10-26 Hitachi Ltd Method for manufacturing semiconductor device with passivation film
JPS4866777A (enExample) * 1971-12-15 1973-09-12

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113229A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Forming method for insulating film
JPS59159533A (ja) * 1983-03-03 1984-09-10 Toshiba Corp 半導体装置の製造方法
US5362526A (en) * 1986-12-19 1994-11-08 Applied Materials, Inc. Plasma-enhanced CVD process using TEOS for depositing silicon oxide
US5755886A (en) * 1986-12-19 1998-05-26 Applied Materials, Inc. Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing
US5871811A (en) * 1986-12-19 1999-02-16 Applied Materials, Inc. Method for protecting against deposition on a selected region of a substrate

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