JPS515936B2 - - Google Patents
Info
- Publication number
- JPS515936B2 JPS515936B2 JP8932672A JP8932672A JPS515936B2 JP S515936 B2 JPS515936 B2 JP S515936B2 JP 8932672 A JP8932672 A JP 8932672A JP 8932672 A JP8932672 A JP 8932672A JP S515936 B2 JPS515936 B2 JP S515936B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8932672A JPS515936B2 (nl) | 1972-09-06 | 1972-09-06 | |
| CA179,914A CA993253A (en) | 1972-09-06 | 1973-08-29 | Photosensitive composition |
| NL7311904A NL7311904A (nl) | 1972-09-06 | 1973-08-30 | |
| IT2857773A IT995284B (it) | 1972-09-06 | 1973-09-05 | Composizione fotosensibile |
| DE19732345095 DE2345095A1 (de) | 1972-09-06 | 1973-09-06 | Fotoempfindliche masse |
| FR7332172A FR2198171A1 (nl) | 1972-09-06 | 1973-09-06 | |
| GB4203373A GB1449157A (en) | 1972-09-06 | 1973-09-06 | Photosensitive composition |
| US05/637,278 US4063953A (en) | 1972-09-06 | 1975-12-03 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8932672A JPS515936B2 (nl) | 1972-09-06 | 1972-09-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4946428A JPS4946428A (nl) | 1974-05-04 |
| JPS515936B2 true JPS515936B2 (nl) | 1976-02-24 |
Family
ID=13967532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8932672A Expired JPS515936B2 (nl) | 1972-09-06 | 1972-09-06 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS515936B2 (nl) |
| CA (1) | CA993253A (nl) |
| DE (1) | DE2345095A1 (nl) |
| FR (1) | FR2198171A1 (nl) |
| GB (1) | GB1449157A (nl) |
| IT (1) | IT995284B (nl) |
| NL (1) | NL7311904A (nl) |
-
1972
- 1972-09-06 JP JP8932672A patent/JPS515936B2/ja not_active Expired
-
1973
- 1973-08-29 CA CA179,914A patent/CA993253A/en not_active Expired
- 1973-08-30 NL NL7311904A patent/NL7311904A/xx not_active Application Discontinuation
- 1973-09-05 IT IT2857773A patent/IT995284B/it active
- 1973-09-06 DE DE19732345095 patent/DE2345095A1/de active Pending
- 1973-09-06 FR FR7332172A patent/FR2198171A1/fr not_active Withdrawn
- 1973-09-06 GB GB4203373A patent/GB1449157A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT995284B (it) | 1975-11-10 |
| CA993253A (en) | 1976-07-20 |
| JPS4946428A (nl) | 1974-05-04 |
| GB1449157A (en) | 1976-09-15 |
| NL7311904A (nl) | 1974-03-08 |
| DE2345095A1 (de) | 1974-03-14 |
| FR2198171A1 (nl) | 1974-03-29 |