JPS5156885A - Hikarijugoseisoseibutsu - Google Patents

Hikarijugoseisoseibutsu

Info

Publication number
JPS5156885A
JPS5156885A JP50113094A JP11309475A JPS5156885A JP S5156885 A JPS5156885 A JP S5156885A JP 50113094 A JP50113094 A JP 50113094A JP 11309475 A JP11309475 A JP 11309475A JP S5156885 A JPS5156885 A JP S5156885A
Authority
JP
Japan
Prior art keywords
hikarijugoseisoseibutsu
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50113094A
Other languages
English (en)
Other versions
JPS6057442B2 (ja
Inventor
Nemuseku Josefu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB40682/74A external-priority patent/GB1526923A/en
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of JPS5156885A publication Critical patent/JPS5156885A/ja
Publication of JPS6057442B2 publication Critical patent/JPS6057442B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP50113094A 1974-09-18 1975-09-18 光重合性組成物 Expired JPS6057442B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB4068274 1974-09-18
GB40682/74A GB1526923A (en) 1974-09-18 1974-09-18 Photopolymerisable compositions
GB759875 1975-02-24
GB759875 1975-02-24

Publications (2)

Publication Number Publication Date
JPS5156885A true JPS5156885A (en) 1976-05-18
JPS6057442B2 JPS6057442B2 (ja) 1985-12-14

Family

ID=26241548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50113094A Expired JPS6057442B2 (ja) 1974-09-18 1975-09-18 光重合性組成物

Country Status (9)

Country Link
JP (1) JPS6057442B2 (ja)
DE (1) DE2541709C2 (ja)
DK (1) DK415875A (ja)
FR (1) FR2285423A1 (ja)
IE (1) IE42085B1 (ja)
IT (1) IT1042624B (ja)
NL (1) NL179654C (ja)
NZ (1) NZ178699A (ja)
SE (1) SE425399B (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
WO2002018332A1 (fr) * 2000-08-30 2002-03-07 Wako Pure Chemical Industries, Ltd. Compose de sel de sulfonium
WO2011096195A1 (en) 2010-02-05 2011-08-11 Canon Kabushiki Kaisha Photosensitive resin composition, method for producing structure, and liquid discharge head
US9061499B2 (en) 2010-02-05 2015-06-23 Canon Kabushiki Kaisha Negative photosensitive resin composition, pattern formation method, and liquid discharge head

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604954A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
US4273668A (en) * 1977-09-14 1981-06-16 General Electric Company Arylsulfonium salt-solvent mixtures
GB1596000A (en) * 1977-09-14 1981-08-19 Gen Electric Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
US4186108A (en) * 1978-02-08 1980-01-29 Minnesota Mining And Manufacturing Company Liquid compositions containing triarylsulfonium complex salts and oxyethylene material
US4218531A (en) * 1978-02-08 1980-08-19 Minnesota Mining And Manufacturing Company Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions
EP0011918B1 (en) * 1978-10-27 1984-03-07 Imperial Chemical Industries Plc Polymerisable compositions, derived coatings and other polymerised products
US4231886A (en) * 1979-01-29 1980-11-04 Minnesota Mining And Manufacturing Company Ester solutions of complex salts
DE2967466D1 (en) * 1979-02-12 1985-07-18 Gen Electric Coating method and curable compositions
DE3909688A1 (de) * 1989-03-23 1990-09-27 Espe Stiftung Verfahren zum kleben oder vergiessen von substraten und vorrichtung zur seiner durchfuehrung
SE8901048D0 (sv) * 1989-03-23 1989-03-23 Becker Wilhelm Ab Polymerisationsinitiator
US6723483B1 (en) 1999-12-27 2004-04-20 Wako Pure Chemical Industries, Ltd. Sulfonium salt compounds
JP4448730B2 (ja) 2004-04-20 2010-04-14 富士フイルム株式会社 感光性組成物、該感光性組成物に用いられる化合物及び該感光性組成物を用いたパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) * 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
WO2002018332A1 (fr) * 2000-08-30 2002-03-07 Wako Pure Chemical Industries, Ltd. Compose de sel de sulfonium
CN1297537C (zh) * 2000-08-30 2007-01-31 和光纯药工业株式会社 锍盐化合物
KR100763625B1 (ko) * 2000-08-30 2007-10-05 와코 쥰야꾸 고교 가부시키가이샤 술포늄염화합물
WO2011096195A1 (en) 2010-02-05 2011-08-11 Canon Kabushiki Kaisha Photosensitive resin composition, method for producing structure, and liquid discharge head
JP2011180586A (ja) * 2010-02-05 2011-09-15 Canon Inc 感光性樹脂組成物、液体吐出装置及び微細構造体の製造方法
US8980968B2 (en) 2010-02-05 2015-03-17 Canon Kabushiki Kaisha Photosensitive resin composition, method for producing structure, and liquid discharge head
US9061499B2 (en) 2010-02-05 2015-06-23 Canon Kabushiki Kaisha Negative photosensitive resin composition, pattern formation method, and liquid discharge head
EP3064996A1 (en) * 2010-02-05 2016-09-07 Canon Kabushiki Kaisha Liquid discharge head

Also Published As

Publication number Publication date
DK415875A (da) 1976-03-19
AU8489975A (en) 1977-03-24
SE7510390L (ja) 1976-03-19
IT1042624B (it) 1980-01-30
SE425399B (sv) 1982-09-27
JPS6057442B2 (ja) 1985-12-14
IE42085B1 (en) 1980-06-04
IE42085L (en) 1976-03-18
DE2541709C2 (de) 1985-02-21
FR2285423A1 (fr) 1976-04-16
DE2541709A1 (de) 1976-04-01
NL179654B (nl) 1986-05-16
NZ178699A (en) 1978-03-06
NL7510920A (nl) 1976-03-22
FR2285423B1 (ja) 1979-08-31
NL179654C (nl) 1986-10-16

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