JPS512975A - ETSUCHINGUEKI - Google Patents

ETSUCHINGUEKI

Info

Publication number
JPS512975A
JPS512975A JP7333674A JP7333674A JPS512975A JP S512975 A JPS512975 A JP S512975A JP 7333674 A JP7333674 A JP 7333674A JP 7333674 A JP7333674 A JP 7333674A JP S512975 A JPS512975 A JP S512975A
Authority
JP
Japan
Prior art keywords
etsuchingueki
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7333674A
Other languages
Japanese (ja)
Inventor
Hajime Inoe
Fumio Harada
Kazunobu Kato
Shoji Oikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7333674A priority Critical patent/JPS512975A/en
Publication of JPS512975A publication Critical patent/JPS512975A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
JP7333674A 1974-06-28 1974-06-28 ETSUCHINGUEKI Pending JPS512975A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7333674A JPS512975A (en) 1974-06-28 1974-06-28 ETSUCHINGUEKI

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7333674A JPS512975A (en) 1974-06-28 1974-06-28 ETSUCHINGUEKI

Publications (1)

Publication Number Publication Date
JPS512975A true JPS512975A (en) 1976-01-12

Family

ID=13515209

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7333674A Pending JPS512975A (en) 1974-06-28 1974-06-28 ETSUCHINGUEKI

Country Status (1)

Country Link
JP (1) JPS512975A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56150594A (en) * 1980-04-25 1981-11-21 Mitsubishi Chem Ind Ltd Production of support for lithographic machine plate
BE1003761A3 (en) * 1989-10-24 1992-06-09 Solvay Baths and method for polish chemical surface copper or copper alloy.
US5640745A (en) * 1994-03-01 1997-06-24 Heberlein Maschinenfabrik Ag Method and apparatus for the manufacture of a mixed yarn using multifilament yarn and fibers
US6088892A (en) * 1996-02-15 2000-07-18 Heberlein Fibertechnology, Inc. Method of aerodynamic texturing, texturing nozzle, nozzle head and use thereof
KR101157207B1 (en) * 2010-04-12 2012-06-20 솔브레인 주식회사 Etchant for thin film transistor-liquid crystal display

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56150594A (en) * 1980-04-25 1981-11-21 Mitsubishi Chem Ind Ltd Production of support for lithographic machine plate
JPH026636B2 (en) * 1980-04-25 1990-02-13 Mitsubishi Chem Ind
BE1003761A3 (en) * 1989-10-24 1992-06-09 Solvay Baths and method for polish chemical surface copper or copper alloy.
US5640745A (en) * 1994-03-01 1997-06-24 Heberlein Maschinenfabrik Ag Method and apparatus for the manufacture of a mixed yarn using multifilament yarn and fibers
US6088892A (en) * 1996-02-15 2000-07-18 Heberlein Fibertechnology, Inc. Method of aerodynamic texturing, texturing nozzle, nozzle head and use thereof
KR101157207B1 (en) * 2010-04-12 2012-06-20 솔브레인 주식회사 Etchant for thin film transistor-liquid crystal display

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