JPS51141622A - Photo-sensitive compositions - Google Patents

Photo-sensitive compositions

Info

Publication number
JPS51141622A
JPS51141622A JP6616475A JP6616475A JPS51141622A JP S51141622 A JPS51141622 A JP S51141622A JP 6616475 A JP6616475 A JP 6616475A JP 6616475 A JP6616475 A JP 6616475A JP S51141622 A JPS51141622 A JP S51141622A
Authority
JP
Japan
Prior art keywords
photo
sensitive compositions
compositions
ketosulfoxide
photocurable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6616475A
Other languages
English (en)
Other versions
JPS5857729B2 (ja
Inventor
Kazuhiko Yamashita
Kazuhito Koen
Toshiyasu Ito
Joji Nagaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chemical Industries Ltd filed Critical Wako Pure Chemical Industries Ltd
Priority to JP6616475A priority Critical patent/JPS5857729B2/ja
Publication of JPS51141622A publication Critical patent/JPS51141622A/ja
Publication of JPS5857729B2 publication Critical patent/JPS5857729B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP6616475A 1975-06-02 1975-06-02 カンコウセイソセイブツ Expired JPS5857729B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6616475A JPS5857729B2 (ja) 1975-06-02 1975-06-02 カンコウセイソセイブツ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6616475A JPS5857729B2 (ja) 1975-06-02 1975-06-02 カンコウセイソセイブツ

Publications (2)

Publication Number Publication Date
JPS51141622A true JPS51141622A (en) 1976-12-06
JPS5857729B2 JPS5857729B2 (ja) 1983-12-21

Family

ID=13307924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6616475A Expired JPS5857729B2 (ja) 1975-06-02 1975-06-02 カンコウセイソセイブツ

Country Status (1)

Country Link
JP (1) JPS5857729B2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55178818U (ja) * 1979-06-07 1980-12-22

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55178818U (ja) * 1979-06-07 1980-12-22

Also Published As

Publication number Publication date
JPS5857729B2 (ja) 1983-12-21

Similar Documents

Publication Publication Date Title
ES452942A1 (es) Procedimiento para la produccion de dihidrociclosporina c.
BE845746A (fr) Compositions photopolymerisables
JPS5335518A (en) Light sensitive composition
BE837782A (fr) Compositions photopolymerisables
AR217039A1 (es) Composicion fotopolimerizable
SE431880B (sv) Fotopolymeriserbar komposition
FR2307293A1 (fr) Composition photo-durcissable
SE7603029L (sv) Halvledande komposition
SE433618B (sv) Sett att framstella en detergentkomposition i celluler partikelform
BE841130A (fr) Composition refractaire a mettre en place par projection.
SE7507866L (sv) Genom bestralning med ultraviolett ljus fotopolymeriserbar komposition.
JPS51141622A (en) Photo-sensitive compositions
AU510213B2 (en) Photocurable compositions
ES446666A1 (es) Un procedimiento para la preparacion de nuevos derivados de 5-fenil-2-furamidoxinicas.
ES462849A1 (es) Un procedimiento para la preparacion de nuevos derivados de 3,5-diona-4,4-dimetil-pirrolidina.
SE421696B (sv) Sett att framstella 2,9-dioxatricyklo-(4,3,1,0?723,?727)-dekaner
BE820404A (fr) Compositions photopolymerisables
JPS5212825A (en) Visible light sensitive composition
ES416236A1 (es) Un procedimiento para la realizacion de reacciones quimicasiniciadas por peroxidos organicos.
BE825702A (fr) Composition resineuse photodurcissable
SE7603634L (sv) Fotopolymeriserbar komposition
JPS5235642A (en) Organic photo-electroconductive material
JPS5234714A (en) Photosensitive composition
BE874179A (fr) Composition refractaire a damer, mouler ou appliquer par projection
JPS5247098A (en) Process for preparing modified polyesters