JPS51121234A - An elastic surface-wave system - Google Patents

An elastic surface-wave system

Info

Publication number
JPS51121234A
JPS51121234A JP4617675A JP4617675A JPS51121234A JP S51121234 A JPS51121234 A JP S51121234A JP 4617675 A JP4617675 A JP 4617675A JP 4617675 A JP4617675 A JP 4617675A JP S51121234 A JPS51121234 A JP S51121234A
Authority
JP
Japan
Prior art keywords
elastic surface
wave system
wave
elastic
reduce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4617675A
Other languages
Japanese (ja)
Inventor
Shigeyuki Uematsu
Masahiro Hayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4617675A priority Critical patent/JPS51121234A/en
Publication of JPS51121234A publication Critical patent/JPS51121234A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient

Abstract

PURPOSE:To reduce the temperature sensitivity of the frequency characteristic.
JP4617675A 1975-04-16 1975-04-16 An elastic surface-wave system Pending JPS51121234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4617675A JPS51121234A (en) 1975-04-16 1975-04-16 An elastic surface-wave system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4617675A JPS51121234A (en) 1975-04-16 1975-04-16 An elastic surface-wave system

Publications (1)

Publication Number Publication Date
JPS51121234A true JPS51121234A (en) 1976-10-23

Family

ID=12739707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4617675A Pending JPS51121234A (en) 1975-04-16 1975-04-16 An elastic surface-wave system

Country Status (1)

Country Link
JP (1) JPS51121234A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3786373A (en) * 1971-10-01 1974-01-15 Raytheon Co Temperature compensated acoustic surface wave device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3786373A (en) * 1971-10-01 1974-01-15 Raytheon Co Temperature compensated acoustic surface wave device

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