JPS51120713A - Positive type photo-resistant compound - Google Patents

Positive type photo-resistant compound

Info

Publication number
JPS51120713A
JPS51120713A JP4563275A JP4563275A JPS51120713A JP S51120713 A JPS51120713 A JP S51120713A JP 4563275 A JP4563275 A JP 4563275A JP 4563275 A JP4563275 A JP 4563275A JP S51120713 A JPS51120713 A JP S51120713A
Authority
JP
Japan
Prior art keywords
positive type
type photo
resistant compound
resistant
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4563275A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5654618B2 (enrdf_load_stackoverflow
Inventor
Kunihiro Isori
Hirohisa Kato
Hitoshi Tomii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4563275A priority Critical patent/JPS51120713A/ja
Publication of JPS51120713A publication Critical patent/JPS51120713A/ja
Publication of JPS5654618B2 publication Critical patent/JPS5654618B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP4563275A 1975-04-15 1975-04-15 Positive type photo-resistant compound Granted JPS51120713A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4563275A JPS51120713A (en) 1975-04-15 1975-04-15 Positive type photo-resistant compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4563275A JPS51120713A (en) 1975-04-15 1975-04-15 Positive type photo-resistant compound

Publications (2)

Publication Number Publication Date
JPS51120713A true JPS51120713A (en) 1976-10-22
JPS5654618B2 JPS5654618B2 (enrdf_load_stackoverflow) 1981-12-26

Family

ID=12724729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4563275A Granted JPS51120713A (en) 1975-04-15 1975-04-15 Positive type photo-resistant compound

Country Status (1)

Country Link
JP (1) JPS51120713A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4696886A (en) * 1982-05-25 1987-09-29 Sumitomo Chemical Company, Limited Positive photoresist composition with m-hydroxy-α-methylstyrene homopolymer and quinonediazide compound

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956114U (ja) * 1982-10-08 1984-04-12 技研株式会社 自動車窓用遮光板の止金具
JPH0472016U (enrdf_load_stackoverflow) * 1990-11-07 1992-06-25

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4696886A (en) * 1982-05-25 1987-09-29 Sumitomo Chemical Company, Limited Positive photoresist composition with m-hydroxy-α-methylstyrene homopolymer and quinonediazide compound

Also Published As

Publication number Publication date
JPS5654618B2 (enrdf_load_stackoverflow) 1981-12-26

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