JPS5111433A - KOJUGOKANONAZAIRYO - Google Patents

KOJUGOKANONAZAIRYO

Info

Publication number
JPS5111433A
JPS5111433A JP7138675A JP7138675A JPS5111433A JP S5111433 A JPS5111433 A JP S5111433A JP 7138675 A JP7138675 A JP 7138675A JP 7138675 A JP7138675 A JP 7138675A JP S5111433 A JPS5111433 A JP S5111433A
Authority
JP
Japan
Prior art keywords
kojugokanonazairyo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7138675A
Other languages
Japanese (ja)
Other versions
JPS599895B2 (en
Inventor
Bauman Nikurausu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS5111433A publication Critical patent/JPS5111433A/en
Publication of JPS599895B2 publication Critical patent/JPS599895B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP7138675A 1974-06-11 1975-06-11 photopolymerizable materials Expired JPS599895B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH795774A CH604208A5 (en) 1974-06-11 1974-06-11
CH795774 1974-06-11

Publications (2)

Publication Number Publication Date
JPS5111433A true JPS5111433A (en) 1976-01-29
JPS599895B2 JPS599895B2 (en) 1984-03-06

Family

ID=4332963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7138675A Expired JPS599895B2 (en) 1974-06-11 1975-06-11 photopolymerizable materials

Country Status (7)

Country Link
JP (1) JPS599895B2 (en)
BE (1) BE830050A (en)
CA (1) CA1062529A (en)
CH (1) CH604208A5 (en)
DE (1) DE2525673A1 (en)
FR (1) FR2274952A1 (en)
GB (1) GB1504616A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5058880A (en) * 1973-09-22 1975-05-21
JPS5456267A (en) * 1975-12-29 1979-05-07 Volvo Flygmotor Ab Method of burning gaseous and liquid waste and its facility
JP2020033452A (en) * 2018-08-30 2020-03-05 株式会社リコー Active energy ray-curable liquid, active energy ray-curable liquid set, method for producing molding, and device for producing molding

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4422972A (en) 1980-08-21 1983-12-27 Eastman Kodak Company Novel light-sensitive compounds and photoreactable compositions comprising same
US4302527A (en) 1980-08-21 1981-11-24 Eastman Kodak Company Photoreactive compositions comprising a light sensitive compound and another compound with reactive site
US4542088A (en) * 1982-03-18 1985-09-17 Konishiroku Photo Industry Co., Ltd. Photopolymerizable compositions and image-forming materials using said compositions
DE3340210C2 (en) * 1982-04-07 1995-06-22 Sony Corp Photosensitive material and process for the production of an image
JPS5965840A (en) * 1982-10-07 1984-04-14 Sanyo Kokusaku Pulp Co Ltd Formation of colored image and photosensitive material for forming colored image
JPH0697339B2 (en) * 1984-02-02 1994-11-30 富士写真フイルム株式会社 Photopolymerizable composition
GB8718528D0 (en) * 1987-08-05 1987-09-09 Ciba Geigy Ag Photopolymerisable composition
DE19519740B4 (en) * 1995-06-02 2005-04-21 Mann + Hummel Gmbh heat exchangers
GB2476275A (en) * 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5058880A (en) * 1973-09-22 1975-05-21
JPS5119718B2 (en) * 1973-09-22 1976-06-19
JPS5456267A (en) * 1975-12-29 1979-05-07 Volvo Flygmotor Ab Method of burning gaseous and liquid waste and its facility
JP2020033452A (en) * 2018-08-30 2020-03-05 株式会社リコー Active energy ray-curable liquid, active energy ray-curable liquid set, method for producing molding, and device for producing molding
US11639400B2 (en) 2018-08-30 2023-05-02 Ricoh Company, Ltd. Active energy ray curable liquid, method of manufacturing fabrication object, resin fabrication object, and gel fabrication object

Also Published As

Publication number Publication date
CA1062529A (en) 1979-09-18
BE830050A (en) 1975-12-10
JPS599895B2 (en) 1984-03-06
FR2274952A1 (en) 1976-01-09
GB1504616A (en) 1978-03-22
CH604208A5 (en) 1978-08-31
FR2274952B1 (en) 1977-07-08
DE2525673A1 (en) 1976-01-02

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