JPS5091274A - - Google Patents
Info
- Publication number
- JPS5091274A JPS5091274A JP13776573A JP13776573A JPS5091274A JP S5091274 A JPS5091274 A JP S5091274A JP 13776573 A JP13776573 A JP 13776573A JP 13776573 A JP13776573 A JP 13776573A JP S5091274 A JPS5091274 A JP S5091274A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13776573A JPS5091274A (US07166745-20070123-C00016.png) | 1973-12-12 | 1973-12-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13776573A JPS5091274A (US07166745-20070123-C00016.png) | 1973-12-12 | 1973-12-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5091274A true JPS5091274A (US07166745-20070123-C00016.png) | 1975-07-21 |
Family
ID=15206294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13776573A Pending JPS5091274A (US07166745-20070123-C00016.png) | 1973-12-12 | 1973-12-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5091274A (US07166745-20070123-C00016.png) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52126760U (US07166745-20070123-C00016.png) * | 1976-03-24 | 1977-09-27 | ||
| JPS53117387A (en) * | 1977-03-23 | 1978-10-13 | Western Electric Co | Method of forming high resolution fine pattern at high speed |
| JPS5698827A (en) * | 1979-01-04 | 1981-08-08 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam exposure device |
| JPS59119666A (ja) * | 1982-12-27 | 1984-07-10 | Fujitsu Ltd | イオンビ−ム照射装置 |
| JPS60262419A (ja) * | 1984-06-08 | 1985-12-25 | Matsushita Electric Ind Co Ltd | パタ−ン形成装置およびそれを用いた半導体装置の製造方法 |
| US4742234A (en) * | 1985-09-27 | 1988-05-03 | American Telephone And Telegraph Company, At&T Bell Laboratories | Charged-particle-beam lithography |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3206397A (en) * | 1962-09-10 | 1965-09-14 | Metaltronics Inc | Cavitational reverse osmotic separation of water from saline solutions |
-
1973
- 1973-12-12 JP JP13776573A patent/JPS5091274A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3206397A (en) * | 1962-09-10 | 1965-09-14 | Metaltronics Inc | Cavitational reverse osmotic separation of water from saline solutions |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52126760U (US07166745-20070123-C00016.png) * | 1976-03-24 | 1977-09-27 | ||
| JPS53117387A (en) * | 1977-03-23 | 1978-10-13 | Western Electric Co | Method of forming high resolution fine pattern at high speed |
| JPS5698827A (en) * | 1979-01-04 | 1981-08-08 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam exposure device |
| JPS59119666A (ja) * | 1982-12-27 | 1984-07-10 | Fujitsu Ltd | イオンビ−ム照射装置 |
| JPS60262419A (ja) * | 1984-06-08 | 1985-12-25 | Matsushita Electric Ind Co Ltd | パタ−ン形成装置およびそれを用いた半導体装置の製造方法 |
| US4742234A (en) * | 1985-09-27 | 1988-05-03 | American Telephone And Telegraph Company, At&T Bell Laboratories | Charged-particle-beam lithography |
