JPS5080834A - - Google Patents
Info
- Publication number
- JPS5080834A JPS5080834A JP48128415A JP12841573A JPS5080834A JP S5080834 A JPS5080834 A JP S5080834A JP 48128415 A JP48128415 A JP 48128415A JP 12841573 A JP12841573 A JP 12841573A JP S5080834 A JPS5080834 A JP S5080834A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12841573A JPS5637542B2 (ja) | 1973-11-16 | 1973-11-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12841573A JPS5637542B2 (ja) | 1973-11-16 | 1973-11-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5080834A true JPS5080834A (ja) | 1975-07-01 |
| JPS5637542B2 JPS5637542B2 (ja) | 1981-09-01 |
Family
ID=14984188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12841573A Expired JPS5637542B2 (ja) | 1973-11-16 | 1973-11-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5637542B2 (ja) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5242260A (en) * | 1975-10-01 | 1977-04-01 | Hitachi Ltd | Preparation of printed circuit |
| JPS53116090A (en) * | 1977-03-22 | 1978-10-11 | Oki Electric Ind Co Ltd | Through-hole forming method for semiconductor integrated circuit |
| JPS564236A (en) * | 1979-06-25 | 1981-01-17 | Nec Corp | Manufacture of photoresist film pattern |
| JPS56129323A (en) * | 1980-03-17 | 1981-10-09 | Toshiba Corp | Manufacture of semiconductor device |
| JPS5732635A (en) * | 1980-08-07 | 1982-02-22 | Nec Corp | Production of semiconductor device |
-
1973
- 1973-11-16 JP JP12841573A patent/JPS5637542B2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5242260A (en) * | 1975-10-01 | 1977-04-01 | Hitachi Ltd | Preparation of printed circuit |
| JPS53116090A (en) * | 1977-03-22 | 1978-10-11 | Oki Electric Ind Co Ltd | Through-hole forming method for semiconductor integrated circuit |
| JPS564236A (en) * | 1979-06-25 | 1981-01-17 | Nec Corp | Manufacture of photoresist film pattern |
| JPS56129323A (en) * | 1980-03-17 | 1981-10-09 | Toshiba Corp | Manufacture of semiconductor device |
| JPS5732635A (en) * | 1980-08-07 | 1982-02-22 | Nec Corp | Production of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5637542B2 (ja) | 1981-09-01 |