JPS5071272A - - Google Patents

Info

Publication number
JPS5071272A
JPS5071272A JP11990673A JP11990673A JPS5071272A JP S5071272 A JPS5071272 A JP S5071272A JP 11990673 A JP11990673 A JP 11990673A JP 11990673 A JP11990673 A JP 11990673A JP S5071272 A JPS5071272 A JP S5071272A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11990673A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11990673A priority Critical patent/JPS5071272A/ja
Publication of JPS5071272A publication Critical patent/JPS5071272A/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP11990673A 1973-10-26 1973-10-26 Pending JPS5071272A (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11990673A JPS5071272A (ko) 1973-10-26 1973-10-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11990673A JPS5071272A (ko) 1973-10-26 1973-10-26

Publications (1)

Publication Number Publication Date
JPS5071272A true JPS5071272A (ko) 1975-06-13

Family

ID=14773120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11990673A Pending JPS5071272A (ko) 1973-10-26 1973-10-26

Country Status (1)

Country Link
JP (1) JPS5071272A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016516287A (ja) * 2012-12-18 2016-06-02 シースター ケミカルズ インク. 薄膜堆積反応器及び薄膜層をインサイチューで乾式浄化するプロセス及び方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016516287A (ja) * 2012-12-18 2016-06-02 シースター ケミカルズ インク. 薄膜堆積反応器及び薄膜層をインサイチューで乾式浄化するプロセス及び方法
US10240230B2 (en) 2012-12-18 2019-03-26 Seastar Chemicals Inc. Process and method for in-situ dry cleaning of thin film deposition reactors and thin film layers

Similar Documents

Publication Publication Date Title
AR201758A1 (ko)
AU476761B2 (ko)
AU465372B2 (ko)
AR201235Q (ko)
AR201231Q (ko)
AU474593B2 (ko)
AU474511B2 (ko)
AU474838B2 (ko)
AU465453B2 (ko)
AU465434B2 (ko)
AU471343B2 (ko)
AU450229B2 (ko)
AU476714B2 (ko)
AR201229Q (ko)
AU472848B2 (ko)
AU466283B2 (ko)
AU476696B2 (ko)
AR199451A1 (ko)
AU477823B2 (ko)
AR201432A1 (ko)
AR200885A1 (ko)
AU447540B2 (ko)
AR195948A1 (ko)
AR210729A1 (ko)
AR195311A1 (ko)