JPS5071272A - - Google Patents
Info
- Publication number
- JPS5071272A JPS5071272A JP11990673A JP11990673A JPS5071272A JP S5071272 A JPS5071272 A JP S5071272A JP 11990673 A JP11990673 A JP 11990673A JP 11990673 A JP11990673 A JP 11990673A JP S5071272 A JPS5071272 A JP S5071272A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11990673A JPS5071272A (ko) | 1973-10-26 | 1973-10-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11990673A JPS5071272A (ko) | 1973-10-26 | 1973-10-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5071272A true JPS5071272A (ko) | 1975-06-13 |
Family
ID=14773120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11990673A Pending JPS5071272A (ko) | 1973-10-26 | 1973-10-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5071272A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016516287A (ja) * | 2012-12-18 | 2016-06-02 | シースター ケミカルズ インク. | 薄膜堆積反応器及び薄膜層をインサイチューで乾式浄化するプロセス及び方法 |
-
1973
- 1973-10-26 JP JP11990673A patent/JPS5071272A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016516287A (ja) * | 2012-12-18 | 2016-06-02 | シースター ケミカルズ インク. | 薄膜堆積反応器及び薄膜層をインサイチューで乾式浄化するプロセス及び方法 |
US10240230B2 (en) | 2012-12-18 | 2019-03-26 | Seastar Chemicals Inc. | Process and method for in-situ dry cleaning of thin film deposition reactors and thin film layers |