JPS5062385A - - Google Patents
Info
- Publication number
- JPS5062385A JPS5062385A JP48110692A JP11069273A JPS5062385A JP S5062385 A JPS5062385 A JP S5062385A JP 48110692 A JP48110692 A JP 48110692A JP 11069273 A JP11069273 A JP 11069273A JP S5062385 A JPS5062385 A JP S5062385A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- H10P50/691—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
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- H10P32/141—
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- H10P32/171—
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- H10P50/642—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/978—Semiconductor device manufacturing: process forming tapered edges on substrate or adjacent layers
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48110692A JPS5062385A (cg-RX-API-DMAC10.html) | 1973-10-02 | 1973-10-02 | |
| US05/510,912 US3980508A (en) | 1973-10-02 | 1974-10-01 | Process of producing semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48110692A JPS5062385A (cg-RX-API-DMAC10.html) | 1973-10-02 | 1973-10-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5062385A true JPS5062385A (cg-RX-API-DMAC10.html) | 1975-05-28 |
Family
ID=14542018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48110692A Pending JPS5062385A (cg-RX-API-DMAC10.html) | 1973-10-02 | 1973-10-02 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3980508A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5062385A (cg-RX-API-DMAC10.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1545208A (en) * | 1975-09-27 | 1979-05-02 | Plessey Co Ltd | Electrical solid state devices |
| US4098638A (en) * | 1977-06-14 | 1978-07-04 | Westinghouse Electric Corp. | Methods for making a sloped insulator for solid state devices |
| JPS55153377A (en) * | 1979-05-18 | 1980-11-29 | Matsushita Electronics Corp | Production of semiconductor device |
| DE3174468D1 (en) * | 1980-09-17 | 1986-05-28 | Hitachi Ltd | Semiconductor device and method of manufacturing the same |
| US4496418A (en) * | 1982-06-30 | 1985-01-29 | Rca Corporation | Process for forming an improved silicon-on-sapphire device |
| US4595454A (en) * | 1984-06-15 | 1986-06-17 | At&T Bell Laboratories | Fabrication of grooved semiconductor devices |
| AU602114B2 (en) * | 1987-09-08 | 1990-09-27 | Ebara Solar, Inc. | Method for texturing a silicon surface of any crystallographic orientation using an isotropic etch and photolithography and silicon crystals made thereby |
| FR2683944B1 (fr) * | 1991-11-14 | 1994-02-18 | Sgs Thomson Microelectronics Sa | Procede de gravure d'un sillon profond. |
| KR0149527B1 (ko) * | 1994-06-15 | 1998-10-01 | 김주용 | 반도체 소자의 고전압용 트랜지스터 및 그 제조방법 |
| KR0167271B1 (ko) * | 1995-11-30 | 1998-12-15 | 문정환 | 비균등 도우프 채널 구조를 갖는 반도체소자의 제조방법 |
| CN110137077A (zh) * | 2018-07-23 | 2019-08-16 | 扬州虹扬科技发展有限公司 | 一种二极管组件沟槽抛光方法 |
| CN115172157B (zh) * | 2022-07-06 | 2024-06-18 | 安徽华晟新能源科技有限公司 | 单晶硅片的绒面制备方法及太阳能电池 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL135006C (cg-RX-API-DMAC10.html) * | 1958-12-24 | |||
| NL280641A (cg-RX-API-DMAC10.html) * | 1961-07-07 | |||
| US3575644A (en) * | 1963-01-30 | 1971-04-20 | Gen Electric | Semiconductor device with double positive bevel |
| US3713913A (en) * | 1968-12-20 | 1973-01-30 | Siemens Ag | Method of producing diffused semiconductor components from silicon |
| US3669775A (en) * | 1969-12-29 | 1972-06-13 | Bell Telephone Labor Inc | Removal of boron and phosphorous-containing glasses from silicon surfaces |
| US3842490A (en) * | 1971-04-21 | 1974-10-22 | Signetics Corp | Semiconductor structure with sloped side walls and method |
| US3767485A (en) * | 1971-12-29 | 1973-10-23 | A Sahagun | Method for producing improved pn junction |
| JPS5217995B2 (cg-RX-API-DMAC10.html) * | 1972-02-18 | 1977-05-19 | ||
| US3769109A (en) * | 1972-04-19 | 1973-10-30 | Bell Telephone Labor Inc | PRODUCTION OF SiO{11 {11 TAPERED FILMS |
-
1973
- 1973-10-02 JP JP48110692A patent/JPS5062385A/ja active Pending
-
1974
- 1974-10-01 US US05/510,912 patent/US3980508A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US3980508A (en) | 1976-09-14 |