JPS5056886A - - Google Patents
Info
- Publication number
- JPS5056886A JPS5056886A JP10307873A JP10307873A JPS5056886A JP S5056886 A JPS5056886 A JP S5056886A JP 10307873 A JP10307873 A JP 10307873A JP 10307873 A JP10307873 A JP 10307873A JP S5056886 A JPS5056886 A JP S5056886A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10307873A JPS5056886A (de) | 1973-09-14 | 1973-09-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10307873A JPS5056886A (de) | 1973-09-14 | 1973-09-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5056886A true JPS5056886A (de) | 1975-05-17 |
Family
ID=14344592
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10307873A Pending JPS5056886A (de) | 1973-09-14 | 1973-09-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5056886A (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5315089A (en) * | 1976-07-27 | 1978-02-10 | Sharp Corp | Semiconductor device |
JPS62102544A (ja) * | 1985-10-28 | 1987-05-13 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 多層金属絶縁体構造の形成方法 |
WO1987005441A1 (en) * | 1986-03-05 | 1987-09-11 | Sumitomo Electric Industries, Ltd. | Semiconductor device and a method of producing the same |
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1973
- 1973-09-14 JP JP10307873A patent/JPS5056886A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5315089A (en) * | 1976-07-27 | 1978-02-10 | Sharp Corp | Semiconductor device |
JPS5819130B2 (ja) * | 1976-07-27 | 1983-04-16 | シャープ株式会社 | 半導体装置の製造方法 |
JPS62102544A (ja) * | 1985-10-28 | 1987-05-13 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 多層金属絶縁体構造の形成方法 |
JPH0546983B2 (de) * | 1985-10-28 | 1993-07-15 | Ibm | |
WO1987005441A1 (en) * | 1986-03-05 | 1987-09-11 | Sumitomo Electric Industries, Ltd. | Semiconductor device and a method of producing the same |