JPS5055333A - - Google Patents

Info

Publication number
JPS5055333A
JPS5055333A JP48103565A JP10356573A JPS5055333A JP S5055333 A JPS5055333 A JP S5055333A JP 48103565 A JP48103565 A JP 48103565A JP 10356573 A JP10356573 A JP 10356573A JP S5055333 A JPS5055333 A JP S5055333A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP48103565A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48103565A priority Critical patent/JPS5055333A/ja
Publication of JPS5055333A publication Critical patent/JPS5055333A/ja
Pending legal-status Critical Current

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Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP48103565A 1973-09-13 1973-09-13 Pending JPS5055333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP48103565A JPS5055333A (ja) 1973-09-13 1973-09-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48103565A JPS5055333A (ja) 1973-09-13 1973-09-13

Publications (1)

Publication Number Publication Date
JPS5055333A true JPS5055333A (ja) 1975-05-15

Family

ID=14357315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48103565A Pending JPS5055333A (ja) 1973-09-13 1973-09-13

Country Status (1)

Country Link
JP (1) JPS5055333A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151150A (ja) * 1984-08-21 1986-03-13 Sony Corp パタ−ン形成方法及び露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151150A (ja) * 1984-08-21 1986-03-13 Sony Corp パタ−ン形成方法及び露光装置

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