JPS5050041A - - Google Patents
Info
- Publication number
- JPS5050041A JPS5050041A JP9823173A JP9823173A JPS5050041A JP S5050041 A JPS5050041 A JP S5050041A JP 9823173 A JP9823173 A JP 9823173A JP 9823173 A JP9823173 A JP 9823173A JP S5050041 A JPS5050041 A JP S5050041A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrophotography Using Other Than Carlson'S Method (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9823173A JPS511971B2 (en:Method) | 1973-09-03 | 1973-09-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9823173A JPS511971B2 (en:Method) | 1973-09-03 | 1973-09-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5050041A true JPS5050041A (en:Method) | 1975-05-06 |
| JPS511971B2 JPS511971B2 (en:Method) | 1976-01-22 |
Family
ID=14214174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9823173A Expired JPS511971B2 (en:Method) | 1973-09-03 | 1973-09-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS511971B2 (en:Method) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS526203A (en) * | 1975-06-30 | 1977-01-18 | Ibm | Method of forming positive resist image |
| JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
| JPS58114033A (ja) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | パタ−ン形成方法 |
-
1973
- 1973-09-03 JP JP9823173A patent/JPS511971B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS526203A (en) * | 1975-06-30 | 1977-01-18 | Ibm | Method of forming positive resist image |
| JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
| JPS58114033A (ja) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | パタ−ン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS511971B2 (en:Method) | 1976-01-22 |