JPS503577A - - Google Patents
Info
- Publication number
- JPS503577A JPS503577A JP48053397A JP5339773A JPS503577A JP S503577 A JPS503577 A JP S503577A JP 48053397 A JP48053397 A JP 48053397A JP 5339773 A JP5339773 A JP 5339773A JP S503577 A JPS503577 A JP S503577A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Junction Field-Effect Transistors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48053397A JPS5212064B2 (ja) | 1973-05-14 | 1973-05-14 | |
| US362361A US3861798A (en) | 1972-05-22 | 1973-05-21 | Mask for aligning patterns |
| DE19732326059 DE2326059C3 (de) | 1972-05-22 | 1973-05-22 | Anordnung und Verfahren zum Ausrichten von Mustern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48053397A JPS5212064B2 (ja) | 1973-05-14 | 1973-05-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS503577A true JPS503577A (ja) | 1975-01-14 |
| JPS5212064B2 JPS5212064B2 (ja) | 1977-04-04 |
Family
ID=12941678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48053397A Expired JPS5212064B2 (ja) | 1972-05-22 | 1973-05-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5212064B2 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6461890B2 (ja) * | 2016-11-21 | 2019-01-30 | 本田技研工業株式会社 | 無段変速機用金属エレメントの製造方法 |
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1973
- 1973-05-14 JP JP48053397A patent/JPS5212064B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5212064B2 (ja) | 1977-04-04 |