JPS5029228Y2 - - Google Patents
Info
- Publication number
- JPS5029228Y2 JPS5029228Y2 JP2650471U JP2650471U JPS5029228Y2 JP S5029228 Y2 JPS5029228 Y2 JP S5029228Y2 JP 2650471 U JP2650471 U JP 2650471U JP 2650471 U JP2650471 U JP 2650471U JP S5029228 Y2 JPS5029228 Y2 JP S5029228Y2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2650471U JPS5029228Y2 (ja) | 1971-04-08 | 1971-04-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2650471U JPS5029228Y2 (ja) | 1971-04-08 | 1971-04-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4724735U JPS4724735U (ja) | 1972-11-20 |
| JPS5029228Y2 true JPS5029228Y2 (ja) | 1975-08-28 |
Family
ID=27885381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2650471U Expired JPS5029228Y2 (ja) | 1971-04-08 | 1971-04-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5029228Y2 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6998014B2 (en) | 2002-01-26 | 2006-02-14 | Applied Materials, Inc. | Apparatus and method for plasma assisted deposition |
| US7049226B2 (en) | 2001-09-26 | 2006-05-23 | Applied Materials, Inc. | Integration of ALD tantalum nitride for copper metallization |
-
1971
- 1971-04-08 JP JP2650471U patent/JPS5029228Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7049226B2 (en) | 2001-09-26 | 2006-05-23 | Applied Materials, Inc. | Integration of ALD tantalum nitride for copper metallization |
| US6998014B2 (en) | 2002-01-26 | 2006-02-14 | Applied Materials, Inc. | Apparatus and method for plasma assisted deposition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4724735U (ja) | 1972-11-20 |