JPS5022389A - - Google Patents

Info

Publication number
JPS5022389A
JPS5022389A JP49056070A JP5607074A JPS5022389A JP S5022389 A JPS5022389 A JP S5022389A JP 49056070 A JP49056070 A JP 49056070A JP 5607074 A JP5607074 A JP 5607074A JP S5022389 A JPS5022389 A JP S5022389A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49056070A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5022389A publication Critical patent/JPS5022389A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/53After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
    • C04B41/5338Etching
    • C04B41/5361Etching with molten material
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/91After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/4807Ceramic parts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP49056070A 1973-06-18 1974-05-17 Pending JPS5022389A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US371197A US3878005A (en) 1973-06-18 1973-06-18 Method of chemically polishing metallic oxides

Publications (1)

Publication Number Publication Date
JPS5022389A true JPS5022389A (en) 1975-03-10

Family

ID=23462925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49056070A Pending JPS5022389A (en) 1973-06-18 1974-05-17

Country Status (4)

Country Link
US (1) US3878005A (en)
JP (1) JPS5022389A (en)
DE (1) DE2428696A1 (en)
FR (1) FR2233154B3 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122507A (en) * 1980-03-03 1981-09-26 Nec Corp Antenna having rotary asymmetrical radial beam
JPS63156108U (en) * 1987-03-31 1988-10-13

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033743A (en) * 1974-03-22 1977-07-05 General Electric Company Chemically polished polycrystalline alumina material
US4038117A (en) * 1975-09-04 1977-07-26 Ilc Technology, Inc. Process for gas polishing sapphire and the like
US4011099A (en) * 1975-11-07 1977-03-08 Monsanto Company Preparation of damage-free surface on alpha-alumina
US4069094A (en) * 1976-12-30 1978-01-17 Rca Corporation Method of manufacturing apertured aluminum oxide substrates
US4124698A (en) * 1977-02-14 1978-11-07 Tyco Laboratories, Inc. Method of chemically sharpening monocrystalline ribbon
DE3523961A1 (en) * 1985-07-04 1987-01-15 Licentia Gmbh DEVICE FOR TREATING AT LEAST ONE CERAMIC ITEM IN AN ALKALINE HYDROXIDE MELT
US5330842A (en) * 1992-03-17 1994-07-19 David M. Volz Surface treated vestibule block and process of making the same
FR3023464B1 (en) * 2014-07-08 2017-02-03 Seb Sa ANTI-ADHESIVE COATING COMPRISING AT LEAST ONE FUNCTIONAL DECORATION LAYER AND ARTICLE PROVIDED WITH SUCH COATING
KR102074340B1 (en) 2017-05-26 2020-02-06 한국생산기술연구원 Surface treatment method for sapphire wafer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1242972B (en) * 1964-03-06 1967-06-22 Ibm Deutschland Process for etching SiC
US3510219A (en) * 1966-10-13 1970-05-05 Xerox Corp Optical alignment system
US3668082A (en) * 1970-12-07 1972-06-06 Ibm Method for strongly adhering a metal film on epoxy substrates
US3808065A (en) * 1972-02-28 1974-04-30 Rca Corp Method of polishing sapphire and spinel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122507A (en) * 1980-03-03 1981-09-26 Nec Corp Antenna having rotary asymmetrical radial beam
JPS63156108U (en) * 1987-03-31 1988-10-13

Also Published As

Publication number Publication date
FR2233154A1 (en) 1975-01-10
US3878005A (en) 1975-04-15
DE2428696A1 (en) 1975-01-16
FR2233154B3 (en) 1977-04-15

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