JPS5022389A - - Google Patents
Info
- Publication number
- JPS5022389A JPS5022389A JP49056070A JP5607074A JPS5022389A JP S5022389 A JPS5022389 A JP S5022389A JP 49056070 A JP49056070 A JP 49056070A JP 5607074 A JP5607074 A JP 5607074A JP S5022389 A JPS5022389 A JP S5022389A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
- C04B41/5338—Etching
- C04B41/5361—Etching with molten material
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
- H01L21/4807—Ceramic parts
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US371197A US3878005A (en) | 1973-06-18 | 1973-06-18 | Method of chemically polishing metallic oxides |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5022389A true JPS5022389A (en) | 1975-03-10 |
Family
ID=23462925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49056070A Pending JPS5022389A (en) | 1973-06-18 | 1974-05-17 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3878005A (en) |
JP (1) | JPS5022389A (en) |
DE (1) | DE2428696A1 (en) |
FR (1) | FR2233154B3 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56122507A (en) * | 1980-03-03 | 1981-09-26 | Nec Corp | Antenna having rotary asymmetrical radial beam |
JPS63156108U (en) * | 1987-03-31 | 1988-10-13 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4033743A (en) * | 1974-03-22 | 1977-07-05 | General Electric Company | Chemically polished polycrystalline alumina material |
US4038117A (en) * | 1975-09-04 | 1977-07-26 | Ilc Technology, Inc. | Process for gas polishing sapphire and the like |
US4011099A (en) * | 1975-11-07 | 1977-03-08 | Monsanto Company | Preparation of damage-free surface on alpha-alumina |
US4069094A (en) * | 1976-12-30 | 1978-01-17 | Rca Corporation | Method of manufacturing apertured aluminum oxide substrates |
US4124698A (en) * | 1977-02-14 | 1978-11-07 | Tyco Laboratories, Inc. | Method of chemically sharpening monocrystalline ribbon |
DE3523961A1 (en) * | 1985-07-04 | 1987-01-15 | Licentia Gmbh | DEVICE FOR TREATING AT LEAST ONE CERAMIC ITEM IN AN ALKALINE HYDROXIDE MELT |
US5330842A (en) * | 1992-03-17 | 1994-07-19 | David M. Volz | Surface treated vestibule block and process of making the same |
FR3023464B1 (en) * | 2014-07-08 | 2017-02-03 | Seb Sa | ANTI-ADHESIVE COATING COMPRISING AT LEAST ONE FUNCTIONAL DECORATION LAYER AND ARTICLE PROVIDED WITH SUCH COATING |
KR102074340B1 (en) | 2017-05-26 | 2020-02-06 | 한국생산기술연구원 | Surface treatment method for sapphire wafer |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1242972B (en) * | 1964-03-06 | 1967-06-22 | Ibm Deutschland | Process for etching SiC |
US3510219A (en) * | 1966-10-13 | 1970-05-05 | Xerox Corp | Optical alignment system |
US3668082A (en) * | 1970-12-07 | 1972-06-06 | Ibm | Method for strongly adhering a metal film on epoxy substrates |
US3808065A (en) * | 1972-02-28 | 1974-04-30 | Rca Corp | Method of polishing sapphire and spinel |
-
1973
- 1973-06-18 US US371197A patent/US3878005A/en not_active Expired - Lifetime
-
1974
- 1974-05-17 JP JP49056070A patent/JPS5022389A/ja active Pending
- 1974-06-14 DE DE2428696A patent/DE2428696A1/en active Pending
- 1974-06-17 FR FR7420938A patent/FR2233154B3/fr not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56122507A (en) * | 1980-03-03 | 1981-09-26 | Nec Corp | Antenna having rotary asymmetrical radial beam |
JPS63156108U (en) * | 1987-03-31 | 1988-10-13 |
Also Published As
Publication number | Publication date |
---|---|
FR2233154A1 (en) | 1975-01-10 |
US3878005A (en) | 1975-04-15 |
DE2428696A1 (en) | 1975-01-16 |
FR2233154B3 (en) | 1977-04-15 |