JPS50156870A - - Google Patents
Info
- Publication number
- JPS50156870A JPS50156870A JP6396574A JP6396574A JPS50156870A JP S50156870 A JPS50156870 A JP S50156870A JP 6396574 A JP6396574 A JP 6396574A JP 6396574 A JP6396574 A JP 6396574A JP S50156870 A JPS50156870 A JP S50156870A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6396574A JPS5729042B2 (cs) | 1974-06-07 | 1974-06-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6396574A JPS5729042B2 (cs) | 1974-06-07 | 1974-06-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50156870A true JPS50156870A (cs) | 1975-12-18 |
| JPS5729042B2 JPS5729042B2 (cs) | 1982-06-21 |
Family
ID=13244507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6396574A Expired JPS5729042B2 (cs) | 1974-06-07 | 1974-06-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5729042B2 (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55158626A (en) * | 1979-05-30 | 1980-12-10 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Heat treating apparatus |
| JPS58501927A (ja) * | 1981-12-31 | 1983-11-10 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | シリコン・ウエハ中の酸素析出を減少させるための方法 |
| JPS60140719A (ja) * | 1983-12-28 | 1985-07-25 | Oki Electric Ind Co Ltd | 半導体ウエハの熱処理装置 |
-
1974
- 1974-06-07 JP JP6396574A patent/JPS5729042B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55158626A (en) * | 1979-05-30 | 1980-12-10 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Heat treating apparatus |
| JPS58501927A (ja) * | 1981-12-31 | 1983-11-10 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | シリコン・ウエハ中の酸素析出を減少させるための方法 |
| JPS60140719A (ja) * | 1983-12-28 | 1985-07-25 | Oki Electric Ind Co Ltd | 半導体ウエハの熱処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5729042B2 (cs) | 1982-06-21 |