JPS50153869A - - Google Patents
Info
- Publication number
- JPS50153869A JPS50153869A JP6072974A JP6072974A JPS50153869A JP S50153869 A JPS50153869 A JP S50153869A JP 6072974 A JP6072974 A JP 6072974A JP 6072974 A JP6072974 A JP 6072974A JP S50153869 A JPS50153869 A JP S50153869A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6072974A JPS50153869A (id) | 1974-05-31 | 1974-05-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6072974A JPS50153869A (id) | 1974-05-31 | 1974-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50153869A true JPS50153869A (id) | 1975-12-11 |
Family
ID=13150648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6072974A Pending JPS50153869A (id) | 1974-05-31 | 1974-05-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50153869A (id) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52113188A (en) * | 1976-03-08 | 1977-09-22 | Machlett Lab Inc | Rotary anode target and xxray tube using same |
| US6189546B1 (en) * | 1999-12-29 | 2001-02-20 | Memc Electronic Materials, Inc. | Polishing process for manufacturing dopant-striation-free polished silicon wafers |
-
1974
- 1974-05-31 JP JP6072974A patent/JPS50153869A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52113188A (en) * | 1976-03-08 | 1977-09-22 | Machlett Lab Inc | Rotary anode target and xxray tube using same |
| JPS5845778B2 (ja) * | 1976-03-08 | 1983-10-12 | ザ・マツクレツト・ラボラトリ−ス・インコ−ポレ−テツド | 回転アノ−ド形ｘ線タ−ゲット |
| US6189546B1 (en) * | 1999-12-29 | 2001-02-20 | Memc Electronic Materials, Inc. | Polishing process for manufacturing dopant-striation-free polished silicon wafers |