JPS50148285A - - Google Patents
Info
- Publication number
- JPS50148285A JPS50148285A JP7866574A JP7866574A JPS50148285A JP S50148285 A JPS50148285 A JP S50148285A JP 7866574 A JP7866574 A JP 7866574A JP 7866574 A JP7866574 A JP 7866574A JP S50148285 A JPS50148285 A JP S50148285A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7866574A JPS50148285A (en) | 1974-05-02 | 1974-05-02 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7866574A JPS50148285A (en) | 1974-05-02 | 1974-05-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50148285A true JPS50148285A (en) | 1975-11-27 |
Family
ID=13668145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7866574A Pending JPS50148285A (en) | 1974-05-02 | 1974-05-02 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS50148285A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55110126A (en) * | 1979-02-16 | 1980-08-25 | Seiko Epson Corp | Preparation of antireflection film |
JPS6468470A (en) * | 1987-09-09 | 1989-03-14 | Ulvac Seimaku | Plasma electron beam heating source |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4934483A (en) * | 1972-07-31 | 1974-03-29 |
-
1974
- 1974-05-02 JP JP7866574A patent/JPS50148285A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4934483A (en) * | 1972-07-31 | 1974-03-29 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55110126A (en) * | 1979-02-16 | 1980-08-25 | Seiko Epson Corp | Preparation of antireflection film |
JPS6149387B2 (en) * | 1979-02-16 | 1986-10-29 | Suwa Seikosha Kk | |
JPS6468470A (en) * | 1987-09-09 | 1989-03-14 | Ulvac Seimaku | Plasma electron beam heating source |