JPS5014277A - - Google Patents
Info
- Publication number
- JPS5014277A JPS5014277A JP6404573A JP6404573A JPS5014277A JP S5014277 A JPS5014277 A JP S5014277A JP 6404573 A JP6404573 A JP 6404573A JP 6404573 A JP6404573 A JP 6404573A JP S5014277 A JPS5014277 A JP S5014277A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6404573A JPS5218099B2 (en:Method) | 1973-06-07 | 1973-06-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6404573A JPS5218099B2 (en:Method) | 1973-06-07 | 1973-06-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5014277A true JPS5014277A (en:Method) | 1975-02-14 |
| JPS5218099B2 JPS5218099B2 (en:Method) | 1977-05-19 |
Family
ID=13246729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6404573A Expired JPS5218099B2 (en:Method) | 1973-06-07 | 1973-06-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5218099B2 (en:Method) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5348676A (en) * | 1976-10-15 | 1978-05-02 | Handotai Kenkyu Shinkokai | Method of forming pattern |
| JPH063806A (ja) * | 1992-06-18 | 1994-01-14 | Nec Corp | 半導体装置の製造方法と露光用マスク |
-
1973
- 1973-06-07 JP JP6404573A patent/JPS5218099B2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5348676A (en) * | 1976-10-15 | 1978-05-02 | Handotai Kenkyu Shinkokai | Method of forming pattern |
| JPH063806A (ja) * | 1992-06-18 | 1994-01-14 | Nec Corp | 半導体装置の製造方法と露光用マスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5218099B2 (en:Method) | 1977-05-19 |