JPS50141614A - - Google Patents
Info
- Publication number
- JPS50141614A JPS50141614A JP49049126A JP4912674A JPS50141614A JP S50141614 A JPS50141614 A JP S50141614A JP 49049126 A JP49049126 A JP 49049126A JP 4912674 A JP4912674 A JP 4912674A JP S50141614 A JPS50141614 A JP S50141614A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49049126A JPS50141614A (en) | 1974-05-01 | 1974-05-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49049126A JPS50141614A (en) | 1974-05-01 | 1974-05-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50141614A true JPS50141614A (en) | 1975-11-14 |
Family
ID=12822361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49049126A Pending JPS50141614A (en) | 1974-05-01 | 1974-05-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50141614A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
-
1974
- 1974-05-01 JP JP49049126A patent/JPS50141614A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| US5494784A (en) * | 1985-08-07 | 1996-02-27 | Japan Synthetic Rubber Co., Ltd. | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
| US5925492A (en) * | 1985-08-07 | 1999-07-20 | Jsr Corporation | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent |
| US6228554B1 (en) | 1985-08-07 | 2001-05-08 | Jsr Corporation | Radiation-sensitive resin composition |
| US6270939B1 (en) | 1985-08-07 | 2001-08-07 | Jsr Corporation | Radiation-sensitive resin composition |