JPS50141403A - - Google Patents
Info
- Publication number
- JPS50141403A JPS50141403A JP4647674A JP4647674A JPS50141403A JP S50141403 A JPS50141403 A JP S50141403A JP 4647674 A JP4647674 A JP 4647674A JP 4647674 A JP4647674 A JP 4647674A JP S50141403 A JPS50141403 A JP S50141403A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4647674A JPS53325B2 (enrdf_load_stackoverflow) | 1974-04-26 | 1974-04-26 | |
| US05/766,348 US4191571A (en) | 1974-04-26 | 1977-02-07 | Method of pattern forming in a photosensitive composition having a reciprocity law failing property |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4647674A JPS53325B2 (enrdf_load_stackoverflow) | 1974-04-26 | 1974-04-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50141403A true JPS50141403A (enrdf_load_stackoverflow) | 1975-11-13 |
| JPS53325B2 JPS53325B2 (enrdf_load_stackoverflow) | 1978-01-07 |
Family
ID=12748235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4647674A Expired JPS53325B2 (enrdf_load_stackoverflow) | 1974-04-26 | 1974-04-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53325B2 (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01198615A (ja) * | 1987-07-28 | 1989-08-10 | Nippon Kayaku Co Ltd | 感光性樹脂組成物 |
| US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
| US6610791B2 (en) | 2000-02-14 | 2003-08-26 | Toyo Gosai Kogyo Co., Ltd. | Photosensitive compound and photosensitive resin |
| EP1348690A1 (en) | 2002-03-29 | 2003-10-01 | Toyo Gosei Kogyo Co., Ltd. | Cinnamaldehyde compound having an azido group |
| US6861456B2 (en) | 2002-03-29 | 2005-03-01 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compound, photosensitive resin, and photosensitive composition |
| WO2020255529A1 (ja) | 2019-06-17 | 2020-12-24 | 東洋合成工業株式会社 | 細胞培養基板、該細胞培養基板の製造方法及び該細胞培養基板を用いたスクリーニング方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01135511U (enrdf_load_stackoverflow) * | 1988-03-04 | 1989-09-18 |
-
1974
- 1974-04-26 JP JP4647674A patent/JPS53325B2/ja not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01198615A (ja) * | 1987-07-28 | 1989-08-10 | Nippon Kayaku Co Ltd | 感光性樹脂組成物 |
| US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
| US6610791B2 (en) | 2000-02-14 | 2003-08-26 | Toyo Gosai Kogyo Co., Ltd. | Photosensitive compound and photosensitive resin |
| EP1348690A1 (en) | 2002-03-29 | 2003-10-01 | Toyo Gosei Kogyo Co., Ltd. | Cinnamaldehyde compound having an azido group |
| US6768027B2 (en) | 2002-03-29 | 2004-07-27 | Toyo Gosei Kogyo Co. Ltd. | Cinnamaldehyde compound having an azido group |
| US6861456B2 (en) | 2002-03-29 | 2005-03-01 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compound, photosensitive resin, and photosensitive composition |
| WO2020255529A1 (ja) | 2019-06-17 | 2020-12-24 | 東洋合成工業株式会社 | 細胞培養基板、該細胞培養基板の製造方法及び該細胞培養基板を用いたスクリーニング方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53325B2 (enrdf_load_stackoverflow) | 1978-01-07 |